P

Inventor

YOSHII YASUHIRO

JP21 patents
⚠️ This page may combine multiple inventors who share the name “YOSHII YASUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

9 patents
US7494762B2Feb 24, 2009

Positive resist composition for immersion lithography and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD8 citations83
US8012669B2Sep 6, 2011

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD15 citations80
US11586111B2Feb 21, 2023

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD2 citations72
US11275306B2Mar 15, 2022

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD2 citations72
US7799507B2Sep 21, 2010

Positive resist composition for immersion lithography and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD6 citations63
US11392033B2Jul 19, 2022

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD1 citations62
US11822240B2Nov 21, 2023

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations60
US11650497B2May 16, 2023

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations51
US11187981B2Nov 30, 2021

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations51

TAKESHITA MASARU

4 patents
US8247161B2Aug 21, 2012

Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin

TAKESHITA MASARU6 citations83
US8486605B2Jul 16, 2013

Positive resist composition and method of forming resist pattern

TAKESHITA MASARU9 citations81
US8530598B2Sep 10, 2013

Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin

TAKESHITA MASARU4 citations61
US8338075B2Dec 25, 2012

Positive resist composition and method of forming resist pattern

TAKESHITA MASARU1 citations50

UTSUMI YOSHIYUKI

2 patents
US8105747B2Jan 31, 2012

Positive resist composition and method of forming resist pattern

UTSUMI YOSHIYUKI4 citations62
US8900788B2Dec 2, 2014

Resist composition for immersion exposure and method of forming resist pattern

UTSUMI YOSHIYUKI0 citations41

HADA HIDEO

2 patents
US9034556B2May 19, 2015

Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern

HADA HIDEO2 citations60
US9040220B2May 26, 2015

Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern

HADA HIDEO0 citations50

HITACHI LTD

1 patent
US5383162AJan 17, 1995

Semiconductor memory device

HITACHI LTD22 citations92

KAWAUE AKIYA

1 patent
US8227169B2Jul 24, 2012

Compound, acid generator, resist composition, and method of forming resist pattern

KAWAUE AKIYA2 citations60

TOMOEGAWA PAPER CO INC

1 patent
US6617021B2Sep 9, 2003

Adhesive composition and adhesive sheet for semiconductor devices

TOMOEGAWA PAPER CO INC4 citations57

YOKOYA JIRO

1 patent
US8877432B2Nov 4, 2014

Method of forming resist pattern and resist composition

YOKOYA JIRO0 citations36