Inventor

ZHANG YOUPING

US59 patents

⚠️ This page may combine multiple inventors who share the name “ZHANG YOUPING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ZHANG YOUPING

ASML NETHERLANDS BV

Alternative target design for metrology using modulation techniques

Measurement apparatus and a method for determining a substrate grid

Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method

Methods and systems for pattern design with tailored response to wavefront aberration

Measuring a process parameter for a manufacturing process involving lithography

Metrology target, method and apparatus, target design method, computer program and lithographic system

Method of manufacturing devices

Metrology using a plurality of metrology target measurement recipes

Metrology method and apparatus, substrate, lithographic method and associated computer product

Method to predict yield of a device manufacturing process

Method for determining root cause affecting yield in a semiconductor manufacturing process

Method for controlling a manufacturing process and associated apparatuses

Method of determining a position of a feature

Method of determining a position of a feature

Process based metrology target design

Method for determining stack configuration of substrate

Measurement apparatus and a method for determining a substrate grid

Method and apparatus for illumination adjustment

Measuring a process parameter for a manufacturing process involving lithography

SYNOPSYS INC

Dissection of printed edges from a fabrication layout for correcting proximity effects

Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects

Dissection of edges with projection points in a fabrication layout for correcting proximity effects

Repetition recognition using segments

Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects

Method and apparatus for performing target-image-based optical proximity correction

Method and apparatus for controlling rippling during optical proximity correction

Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects

Method and apparatus for performing target-image-based optical proximity correction

Method and apparatus for performing target-image-based optical proximity correction

NUMERICAL TECH INC

Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layout

Method and apparatus for reducing optical proximity correction output file size

Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects

Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout

Dissection of edges with projection points in a fabrication layout for correcting proximity effects

Facilitating minimum spacing and/or width control optical proximity correction

Dissection of printed edges from a fabrication layout for correcting proximity effects

Dissection of corners in a fabrication layout for correcting proximity effects

Method and apparatus for controlling rippling during optical proximity correction

Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask

TAKUMI TECHNOLOGY CORP

Integrated circuit design using modified cells

System for designing integrated circuits with enhanced manufacturability

Model-based pattern characterization to generate rules for rule-model-based hybrid optical proximity correction

Creating and applying variable bias rules in rule-based optical proximity correction for reduced complexity

System for integrated circuit layout partition and extraction for independent layout processing

ZHANG YOUPING

System for simplifying layout processing

Model-based pattern characterization to generate rules for rule-model-based hybrid optical proximity correction

FENG HANYING

Methods and systems for pattern design with tailored response to wavefront aberration

LIU HUA-YU

Method of pattern selection for source and mask optimization

UNITED TECHNOLOGIES CORP

Suppressing oscillations in processes such as gas turbine combustion

BAOSHAN IRON & STEEL

Roller treatment process and treatment device suitable for total-amount steel slag treatment