Inventor
JIN YINUO
CN19 patents
⚠️ This page may combine multiple inventors who share the name “JIN YINUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ACM RESEARCH SHANGHAI INC
16 patentsUS11581205B2Feb 14, 2023
Methods and system for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC2 citations73
US11257667B2Feb 22, 2022
Methods and apparatus for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC2 citations73
US11141762B2Oct 12, 2021
System for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC3 citations73
US11037804B2Jun 15, 2021
Methods and apparatus for cleaning substrates
ACM RESEARCH SHANGHAI INC2 citations73
US10910244B2Feb 2, 2021
Methods and system for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC2 citations73
US11967497B2Apr 23, 2024
Methods and apparatus for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC0 citations62
US11911808B2Feb 27, 2024
System for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC0 citations62
US11848217B2Dec 19, 2023
Methods and apparatus for cleaning substrates
ACM RESEARCH SHANGHAI INC0 citations62
US11752529B2Sep 12, 2023
Method for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC0 citations62
US11638937B2May 2, 2023
Methods and apparatus for cleaning substrates
ACM RESEARCH SHANGHAI INC0 citations62
US11633765B2Apr 25, 2023
System for cleaning semiconductor wafers
ACM RESEARCH SHANGHAI INC0 citations62
US11103898B2Aug 31, 2021
Methods and apparatus for cleaning substrates
ACM RESEARCH SHANGHAI INC0 citations62
US12467156B2Nov 11, 2025
Plating apparatus and plating method
ACM RESEARCH SHANGHAI INC0 citations61
US11781235B2Oct 10, 2023
Plating apparatus and plating method
ACM RESEARCH SHANGHAI INC0 citations61
US12564026B2Feb 24, 2026
Method of removing barrier layer
ACM RESEARCH SHANGHAI INC0 citations60
US10227705B2Mar 12, 2019
Apparatus and method for plating and/or polishing wafer
ACM RESEARCH SHANGHAI INC0 citations40