Inventor
BONAM RAVI K
US20 patents
⚠️ This page may combine multiple inventors who share the name “BONAM RAVI K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
19 patentsUS9929012B1Mar 27, 2018
Resist having tuned interface hardmask layer for EUV exposure
IBM20 citations91
US11049844B2Jun 29, 2021
Semiconductor wafer having trenches with varied dimensions for multi-chip modules
IBM3 citations73
US10943883B1Mar 9, 2021
Planar wafer level fan-out of multi-chip modules having different size chips
IBM6 citations73
US10991635B2Apr 27, 2021
Multiple chip bridge connector
IBM2 citations72
US11887908B2Jan 30, 2024
Electronic package structure with offset stacked chips and top and bottom side cooling lid
IBM0 citations62
US11239167B2Feb 1, 2022
Cu—Cu bonding for interconnects on bridge chip attached to chips and packaging substrate
IBM0 citations62
US11081424B2Aug 3, 2021
Micro-fluidic channels having various critical dimensions
IBM0 citations62
US12086528B2Sep 10, 2024
Secure fingerprinting of a trusted photomask
IBM0 citations61
US11619877B2Apr 4, 2023
Determination of optical roughness in EUV structures
IBM0 citations61
US11480868B2Oct 25, 2022
Determination of optical roughness in EUV structures
IBM0 citations61
US11462512B2Oct 4, 2022
Three-dimensional microelectronic package with embedded cooling channels
IBM0 citations61
US10937764B2Mar 2, 2021
Three-dimensional microelectronic package with embedded cooling channels
IBM1 citations61
US11791270B2Oct 17, 2023
Direct bonded heterogeneous integration silicon bridge
IBM0 citations60
US10725454B2Jul 28, 2020
Mask process aware calibration using mask pattern fidelity inspections
IBM1 citations57
US9881762B2Jan 30, 2018
Integrated photoemission sources and scalable photoemission structures
IBM1 citations51
US9263228B2Feb 16, 2016
Integrated photoemission sources and scalable photoemission structures
IBM1 citations51
US10437951B2Oct 8, 2019
Care area generation by detection optimized methodology
IBM0 citations50
US10141188B2Nov 27, 2018
Resist having tuned interface hardmask layer for EUV exposure
IBM0 citations49
US10134592B2Nov 20, 2018
Resist having tuned interface hardmask layer for EUV exposure
IBM0 citations49