Inventor

HARTMANN JEAN-MICHEL

FR21 patents

⚠️ This page may combine multiple inventors who share the name “HARTMANN JEAN-MICHEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HARTMANN JEAN-MICHEL

COMMISSARIAT ENERGIE ATOMIQUE

Method for forming, by CVD, nanostructures of semi-conductor material of homogenous and controlled size on dielectric material

Process for fabricating an array of germanium-based diodes with low dark current

Method for forming doped areas under transistor spacers

Optoelectronic device having an array of germanium-based diodes with low dark current

Process for producing a strained layer based on germanium-tin

Contacting area on germanium

Waveguide manufacturing process

Semiconductor substrate polishing method

Method for fabricating a monocrystalline structure

Low-temperature method for manufacturing a semiconductor-on-insulator substrate

Process for hydrophilically bonding substrates

Method for the nanoscale etching of a germanium-tin alloy (GeSn) for a FET transistor

Method for producing Ge-core based waveguides

Method for fabricating a photonic chip

Contacting area on germanium

Current-assisted photonic demodulator with improved performances including intermediate electrodes

Method for determining preferential deposition parameters for a thin layer of III-V material

COMMISSARIAT À L EN ATOMIQUE ET AUX EN ALTERNATIVES

Method for fabricating a photodetector

WACQUEZ ROMAIN

Method for producing stacked and self-aligned components on a substrate

ST MICROELECTRONICS CROLLES 2 SAS

Method of forming a strained silicon layer

HARTMANN JEAN-MICHEL

Method for fabricating a substrate provided with two active areas with different semiconductor materials