Inventor
FANG YU-PIAO
TW16 patents
Patents
16 patentsUS10658215B2May 19, 2020
Reticle transportation container
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US11837486B2Dec 5, 2023
Reticle transportation container
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11022889B2Jun 1, 2021
Overlay-shift measurement system and method for manufacturing semiconductor structure and measuring alignment mark of semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US10962888B2Mar 30, 2021
Structures for acoustic wave overlay error determination using periodic structures
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10915017B2Feb 9, 2021
Multi-function overlay marks for reducing noise and extracting focus and critical dimension information
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10503082B2Dec 10, 2019
Optical reticle load port
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12189304B2Jan 7, 2025
Method and structures for acoustic wave overlay error determination
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12055860B2Aug 6, 2024
Multi-function overlay marks for reducing noise and extracting focus and critical dimension information
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11835864B2Dec 5, 2023
Multi-function overlay marks for reducing noise and extracting focus and critical dimension information
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11768443B2Sep 26, 2023
Method for manufacturing semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11448975B2Sep 20, 2022
Multi-function overlay marks for reducing noise and extracting focus and critical dimension information
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11378892B2Jul 5, 2022
Overlay-shift measurement system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11018037B2May 25, 2021
Optical reticle load port
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10998213B2May 4, 2021
Reticle transportation container
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10031412B1Jul 24, 2018
Pellicle assembly in photolithography process and method for using the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10497604B2Dec 3, 2019
Photomask transportation stage in semiconductor fabrication and method for using the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations37