Inventor

TACHIBANA SEIICHIRO

JP101 patents

⚠️ This page may combine multiple inventors who share the name “TACHIBANA SEIICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TACHIBANA SEIICHIRO

SHINETSU CHEMICAL CO

Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process

Sulfonium salt-containing polymer, resist composition, and patterning process

Resist composition and patterning process using the same

Polymer, resist composition and patterning process

Polymers, resist compositions and patterning process

Polymer for resist under layer film composition, resist under layer film composition, and patterning process

Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer

Patterning process

Sulfonium salt-containing polymer, resist composition, and patterning process

Lactone-containing compound, polymer, resist composition, and patterning process

Lactone-containing compound, polymer, resist composition, and patterning process

Positive resist composition and patterning process

Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process

Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation

Polymers, resist compositions and patterning process

Polymer, resist composition and patterning process

Resist composition and patterning process using the same

Acetal compound, polymer, resist composition and patterning process

Ester compounds, polymers, resist compositions and patterning process

Ester compounds, polymers, resist compositions and patterning process

Cyclic acetal compound, polymer, resist composition and patterning process

Lactone compounds having alicyclic structure and their manufacturing method

Ester compounds having alicyclic structure and method for preparing same

Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Resist composition and patterning process

Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method

Method for forming a resist under layer film and patterning process

Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process

Method for producing semiconductor apparatus substrate

Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin

Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Negative pattern forming process

Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition

Antireflective coating composition, antireflective coating, and patterning process

Polymerizable ester compounds, polymers, resist compositions and patterning process

Antireflection film composition and patterning process using the same

Polymer, resist composition and patterning process

HATAKEYAMA JUN

Monomer, polymer, chemically amplified positive resist composition, and patterning process

Polymerizable compound, polymer, positive resist composition, and patterning process using the same

Positive resist composition and patterning process

Positive resist composition and patterning process

Resist lower layer film-formed substrate

Positive resist composition and patterning process

OHASHI MASAKI

Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process

Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process

OHSAWA YOUICHI

Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method

Positive resist composition and patterning process

IBM

Wet strippable gap fill materials

Silicon-containing antireflective coatings including non-polymeric silsesquioxanes

SHINACHI SATOSHI

Carboxyl-containing lactone compound, polymer, resist composition, and patterning process