Inventor
FUNATSU KENJI
JP21 patents
⚠️ This page may combine multiple inventors who share the name “FUNATSU KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
19 patentsUS9250523B2Feb 2, 2016
Resist composition and patterning process
SHINETSU CHEMICAL CO7 citations84
US7718342B2May 18, 2010
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO9 citations84
US7157207B2Jan 2, 2007
Polymer, resist material and patterning processing
SHINETSU CHEMICAL CO12 citations84
US10816900B2Oct 27, 2020
Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film
SHINETSU CHEMICAL CO3 citations73
US9618850B2Apr 11, 2017
Pattern forming process and shrink agent
SHINETSU CHEMICAL CO3 citations73
US9122152B2Sep 1, 2015
Patterning process and resist composition
SHINETSU CHEMICAL CO6 citations73
US9091933B2Jul 28, 2015
Negative pattern forming process
SHINETSU CHEMICAL CO2 citations63
US7135270B2Nov 14, 2006
Resist polymer, resist composition and patterning process
SHINETSU CHEMICAL CO4 citations63
US6835525B2Dec 28, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO4 citations63
US6239303B1May 29, 2001
Silylation of hydroxyl group-containing compound
SHINETSU CHEMICAL CO3 citations62
US12271112B2Apr 8, 2025
Negative resist composition and pattern forming process
SHINETSU CHEMICAL CO0 citations52
US10203601B2Feb 12, 2019
Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film
SHINETSU CHEMICAL CO0 citations52
US9086625B2Jul 21, 2015
Resist composition and patterning process
SHINETSU CHEMICAL CO1 citations52
US9040223B2May 26, 2015
Resist composition, patterning process and polymer
SHINETSU CHEMICAL CO0 citations52
US12429772B2Sep 30, 2025
Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound
SHINETSU CHEMICAL CO0 citations51
US10191373B2Jan 29, 2019
Method for producing polymer
SHINETSU CHEMICAL CO0 citations51
US10457761B2Oct 29, 2019
Polymer, resist composition, and pattern forming process
SHINETSU CHEMICAL CO0 citations41
US9778568B2Oct 3, 2017
Positive resist composition and patterning process
SHINETSU CHEMICAL CO0 citations41
US9551932B2Jan 24, 2017
Patterning process and resist composition
SHINETSU CHEMICAL CO0 citations40