Inventor

KUBOTA MASAFUMI

JP32 patents

⚠️ This page may combine multiple inventors who share the name “KUBOTA MASAFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KUBOTA MASAFUMI

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Method of manufacturing aggregate of semiconductor micro-needles

Plasma treatment method and plasma treatment system

Plasma generating apparatus

Plasma doping method

Wet-etching method and method for manufacturing semiconductor device

Aggregate of semiconductor micro-needles and method of manufacturing the same, and semiconductor apparatus and method of manufacturing the same

Method of fabricating semiconductor device

Method for removing impurities existing in semiconductor substrate

Plasma source for etching

Plasma source for etching

Method of fabricating a semiconductor device having buried insulation layer separated by ditches

Etching method and etching apparatus

Method of making aggregate of semiconductor micro-needles

Plasma generating method and apparatus for generating rotating electrons in the plasma

Method and apparatus for generating highly dense uniform plasma in a high frequency electric field

Method and apparatus for generating highly dense uniform plasma by use of a high frequency rotating electric field

Drying etching method

Method of preventing the corrosion of metallic wirings

Plasma processing method and apparatus for use in carrying out the same

Method for fabricating semiconductor device

Aggregate of semiconductor micro-needles and method of manufacturing the same, and semiconductor apparatus and method of manufacturing the same

Aggregate of semiconductor micro-needles and method of manufacturing the same, and semiconductor apparatus and method of manufacturing the same

Plasma generating and processing method and apparatus thereof

Plasma source for etching

Semiconductor device and method for manufacture thereof

Dry etching method and dry etching apparatus

Semiconductor device and method for fabricating the same

SASAKI YUICHIRO

Method for fabricating semiconductor device and plasma doping apparatus

MATSUSHITA ELECTRIC COMPANY LT

Plasma generating method and apparatus

PANASONIC CORP

Semiconductor device and method for fabricating the same

HAYASHI SHIGENORI

Plasma doping method

ISUZU MOTORS LTD

Warning device utilizing azimuth angles of vehicles