Inventor
YABU TOSHIKI
JP34 patents
⚠️ This page may combine multiple inventors who share the name “YABU TOSHIKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
32 patentsUS6603172B1Aug 5, 2003
Semiconductor device and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD104 citations98
US5972783AOct 26, 1999
Method for fabricating a semiconductor device having a nitrogen diffusion layer
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD125 citations98
US5903031AMay 11, 1999
MIS device, method of manufacturing the same, and method of diagnosing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD117 citations98
US6232656B1May 15, 2001
Semiconductor interconnect formed over an insulation and having moisture resistant material
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD35 citations96
US6143626ANov 7, 2000
Method of manufacturing a semiconductor device using a trench isolation technique
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD51 citations96
US6083785AJul 4, 2000
Method of manufacturing semiconductor device having resistor film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD80 citations96
US5726479AMar 10, 1998
Semiconductor device having polysilicon electrode minimization resulting in a small resistance value
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD79 citations96
US5698902ADec 16, 1997
Semiconductor device having finely configured gate electrodes
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD70 citations96
US5128274AJul 7, 1992
Method for producing a semiconductor device having a LOCOS insulating film with at least two different thickness
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD87 citations96
US6346736B1Feb 12, 2002
Trench isolated semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD58 citations95
US6130139AOct 10, 2000
Method of manufacturing trench-isolated semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD75 citations95
US4771012ASep 13, 1988
Method of making symmetrically controlled implanted regions using rotational angle of the substrate
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD70 citations94
US5989992ANov 23, 1999
Method of making a semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD26 citations93
US5960300ASep 28, 1999
Method of manufacturing semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD24 citations93
US7126174B2Oct 24, 2006
Semiconductor device and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations92
US6281562B1Aug 28, 2001
Semiconductor device which reduces the minimum distance requirements between active areas
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD28 citations92
US6069055AMay 30, 2000
Fabricating method for semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD47 citations92
US5946563AAug 31, 1999
Semiconductor device and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD29 citations92
US5399890AMar 21, 1995
Semiconductor memory device in which a capacitor electrode of a memory cell and an interconnection layer of a peripheral circuit are formed in one level
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD50 citations92
US5270226ADec 14, 1993
Manufacturing method for LDDFETS using oblique ion implantion technique
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD42 citations92
US5241201AAug 31, 1993
Dram with concentric adjacent capacitors
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD30 citations92
US5217914AJun 8, 1993
Method for making semiconductor integration circuit with stacked capacitor cells
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD36 citations92
US5214296AMay 25, 1993
Thin-film semiconductor device and method of fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD37 citations92
US6524904B1Feb 25, 2003
Method of fabricating semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations83
US5879983AMar 9, 1999
Semiconductor device and method for manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD16 citations82
US6492672B1Dec 10, 2002
Semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations74
US6124160ASep 26, 2000
Semiconductor device and method for manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations74
USRE35036ESep 12, 1995
Method of making symmetrically controlled implanted regions using rotational angle of the substrate
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations72
USRE39932EDec 4, 2007
Semiconductor interconnect formed over an insulation and having moisture resistant material
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US6967409B2Nov 22, 2005
Semiconductor device and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US6709950B2Mar 23, 2004
Semiconductor device and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US6570231B1May 27, 2003
Semiconductor device with varying width electrode
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD5 citations61