Inventor

NISHIMURA EIICHI

JP93 patents

⚠️ This page may combine multiple inventors who share the name “NISHIMURA EIICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NISHIMURA EIICHI

TOKYO ELECTRON LTD

Etching method

Method for etching multilayer film

Plasma processing method and plasma processing apparatus

Plasma generating apparatus

Method for removing photoresist and etch residues

Method of manufacturing semiconductor device

Method for etching layer to be etched

Substrate processing method

Method of processing substrate, and method of and program for manufacturing electronic device

Method of processing substrate, method of manufacturing solid-state imaging device, method of manufacturing thin film device, and programs for implementing the methods

Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device

Substrate processing apparatus

Method for etching magnetic layer including isopropyl alcohol and carbon dioxide

Method of cleaning plasma processing apparatus

Method of etching porous film

Pattern forming method

Method for removing photoresist and etch residues

Method and apparatus for bilayer photoresist dry development

Plasma processing method and plasma processing apparatus

Substrate processing method and substrate processing apparatus

Substrate processing method and storage medium

Method of cleaning plasma processing apparatus

Method of etching copper layer and mask

Substrate processing method and substrate processing apparatus

Method of manufacturing semiconductor device

OKI ELECTRIC IND CO LTD

Optical amplifier module

Echo canceler with automatic gain control of echo cancellation signal

Low-power parallel multiplier

Echo canceler compensating for amplifier saturation and echo amplification

Barrel shifter

Multiplying unit circuit

Optical repeated transmission method and system

HITACHI LTD

Anisotropic etching method and apparatus

Anisotropic etching method and apparatus

Method and apparatus for analyzing positron extinction and electron microscope having said apparatus

Control rods and method of producing same

NISHIMURA EIICHI

Plasma processing apparatus

Dry etching method for silicon nitride film

Method of forming etching mask, etching method using the etching mask, and method of fabricating semiconductor device including the etching method

Substrate processing method and storage medium

KUSHIBIKI MASATO

Semiconductor device manufacturing method and plasma etching apparatus

Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition process

Substrate processing method

TOKYO ELECTRON LTD INC

Low-pressure removal of photoresist and etch residue

Low-pressure removal of photoresist and etch residue

TEL YAMANISHI KK

Plasma processing apparatus capable of detecting and regulating actual RF power at electrode within chamber

NIPPON PAINT CO LTD

Coating composition and method for forming multi-layer coating

MURAKAMI CORP

Outer mirror

ISHIKAWA HIRAKU

Method for forming amorphous carbon nitride film, amorphous carbon nitride film, multilayer resist film, method for manufacturing semiconductor device, and storage medium in which control program is stored

MORIYA TSUYOSHI

Method and apparatus for detecting foreign matter attached to peripheral edge of substrate, and storage medium