Inventor
SCHRIEVER MARTIN
DE20 patents
⚠️ This page may combine multiple inventors who share the name “SCHRIEVER MARTIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
14 patentsUS6930758B2Aug 16, 2005
Projection exposure system for microlithography and method for generating microlithographic images
ZEISS CARL SMT AG36 citations96
US7417745B2Aug 26, 2008
Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry
ZEISS CARL SMT AG21 citations92
US7336371B1Feb 26, 2008
Apparatus and method for measuring the wavefront of an optical system
ZEISS CARL SMT AG49 citations92
US7333216B2Feb 19, 2008
Apparatus for wavefront detection
ZEISS CARL SMT AG46 citations92
US7233386B2Jun 19, 2007
Method of optimizing imaging performance
ZEISS CARL SMT AG16 citations92
US7158237B2Jan 2, 2007
Interferometric measuring device and projection exposure installation comprising such measuring device
ZEISS CARL SMT AG19 citations92
US7113260B2Sep 26, 2006
Projection exposure system for microlithography and method for generating microlithographic images
ZEISS CARL SMT AG13 citations92
US7286245B2Oct 23, 2007
Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser
ZEISS CARL SMT AG28 citations91
US7436521B2Oct 14, 2008
Optical measuring apparatus and operating method for imaging error correction in an optical imaging system
ZEISS CARL SMT AG9 citations83
US7408652B2Aug 5, 2008
Device and method for the optical measurement of an optical system by using an immersion fluid
ZEISS CARL SMT AG12 citations81
US7570345B2Aug 4, 2009
Method of optimizing imaging performance
ZEISS CARL SMT AG7 citations73
US6936825B2Aug 30, 2005
Process for the decontamination of microlithographic projection exposure devices
ZEISS CARL SMT AG8 citations68
US7388696B2Jun 17, 2008
Diffuser, wavefront source, wavefront sensor and projection exposure apparatus
ZEISS CARL SMT AG3 citations62
US7230220B2Jun 12, 2007
Method of determining optical properties and projection exposure system comprising a wavefront detection system
ZEISS CARL SMT AG6 citations58