Inventor
SAWADA YOSHIHIRO
JP35 patents
⚠️ This page may combine multiple inventors who share the name “SAWADA YOSHIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
19 patentsUS6303231B1Oct 16, 2001
Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric memories formed with said coating solutions, as well as processes for production thereof
TOKYO OHKA KOGYO CO LTD65 citations95
US5811153ASep 22, 1998
Coating solutions for use in forming bismuth-based dielectric thin films, and dielectric thin films and memories formed with said coating solutions, as well as processes for production thereof
TOKYO OHKA KOGYO CO LTD20 citations92
US7795197B2Sep 14, 2010
Cleaning liquid for lithography and method for resist pattern formation
TOKYO OHKA KOGYO CO LTD10 citations83
US7741260B2Jun 22, 2010
Rinsing fluid for lithography
TOKYO OHKA KOGYO CO LTD12 citations83
US6120912ASep 19, 2000
Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric thin films, ferroelectric capacitors and ferroelectric memories formed with said coating solutions, as well as processes for production thereof
TOKYO OHKA KOGYO CO LTD11 citations73
US5972096AOct 26, 1999
Coating solutions for use in forming bismuth-based ferroelectric thin films
TOKYO OHKA KOGYO CO LTD9 citations73
US8367312B2Feb 5, 2013
Detergent for lithography and method of forming resist pattern with the same
TOKYO OHKA KOGYO CO LTD5 citations72
US6197102B1Mar 6, 2001
Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric thin films, ferroelectric capacitors and ferroelectric memories formed with said coating solutions, as well as processes for production thereof
TOKYO OHKA KOGYO CO LTD11 citations72
US7897325B2Mar 1, 2011
Lithographic rinse solution and method for forming patterned resist layer using the same
TOKYO OHKA KOGYO CO LTD2 citations62
US7811748B2Oct 12, 2010
Resist pattern forming method and composite rinse agent
TOKYO OHKA KOGYO CO LTD2 citations62
US6528172B2Mar 4, 2003
Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric thin films, ferroelectric capacitors and ferroelectric memories formed with said coating solutions, as well as processes for production thereof
TOKYO OHKA KOGYO CO LTD2 citations61
US11120993B2Sep 14, 2021
Diffusing agent composition and method of manufacturing semiconductor substrate
TOKYO OHKA KOGYO CO LTD0 citations56
US11773287B2Oct 3, 2023
Method for forming coating
TOKYO OHKA KOGYO CO LTD0 citations54
US9620354B2Apr 11, 2017
Method for manufacturing semiconductor substrate with diffusion agent composition
TOKYO OHKA KOGYO CO LTD1 citations52
US10525418B2Jan 7, 2020
Purification method for purifying liquid, purification method for purifying silicon compound-containing liquid, method for producing silylating agent liquid, film forming material or diffusing agent composition, filter medium and filter device
TOKYO OHKA KOGYO CO LTD0 citations51
US9831086B2Nov 28, 2017
Method for manufacturing semiconductor substrate
TOKYO OHKA KOGYO CO LTD1 citations51
US10242875B2Mar 26, 2019
Impurity diffusion agent composition and method for manufacturing semiconductor substrate
TOKYO OHKA KOGYO CO LTD0 citations50
US10242874B2Mar 26, 2019
Diffusing agent composition and method of manufacturing semiconductor substrate
TOKYO OHKA KOGYO CO LTD0 citations42
US10504732B2Dec 10, 2019
Impurity diffusion agent composition and method for manufacturing semiconductor substrate
TOKYO OHKA KOGYO CO LTD0 citations41
FUJITSU LTD
6 patentsUS9507905B2Nov 29, 2016
Storage medium storing circuit board design assistance program, circuit board design assistance method, and circuit board design assistance device
FUJITSU LTD3 citations73
US7952578B2May 31, 2011
Support apparatus, design support program, and design support method
FUJITSU LTD2 citations63
US9713262B2Jul 18, 2017
Via adding method
FUJITSU LTD0 citations52
US9173295B2Oct 27, 2015
Support apparatus
FUJITSU LTD0 citations52
US8850376B2Sep 30, 2014
Method, device, and a computer-readable recording medium having stored program for information processing for noise suppression design check
FUJITSU LTD0 citations41
US9905917B2Feb 27, 2018
Antenna device
FUJITSU LTD0 citations37
NIPPON KAYAKU KK
2 patentsUS5378726AJan 3, 1995
New hydrazine derivative and pesticidal composition comprising said derivative as an effective ingredient
NIPPON KAYAKU KK116 citations95
US5530021AJun 25, 1996
Hydrazine derivative and pesticidal composition comprising said derivative as an effective ingredient
NIPPON KAYAKU KK59 citations94