P

Inventor

SAWADA YOSHIHIRO

JP35 patents
⚠️ This page may combine multiple inventors who share the name “SAWADA YOSHIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

19 patents
US6303231B1Oct 16, 2001

Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric memories formed with said coating solutions, as well as processes for production thereof

TOKYO OHKA KOGYO CO LTD65 citations95
US5811153ASep 22, 1998

Coating solutions for use in forming bismuth-based dielectric thin films, and dielectric thin films and memories formed with said coating solutions, as well as processes for production thereof

TOKYO OHKA KOGYO CO LTD20 citations92
US7795197B2Sep 14, 2010

Cleaning liquid for lithography and method for resist pattern formation

TOKYO OHKA KOGYO CO LTD10 citations83
US7741260B2Jun 22, 2010

Rinsing fluid for lithography

TOKYO OHKA KOGYO CO LTD12 citations83
US6120912ASep 19, 2000

Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric thin films, ferroelectric capacitors and ferroelectric memories formed with said coating solutions, as well as processes for production thereof

TOKYO OHKA KOGYO CO LTD11 citations73
US5972096AOct 26, 1999

Coating solutions for use in forming bismuth-based ferroelectric thin films

TOKYO OHKA KOGYO CO LTD9 citations73
US8367312B2Feb 5, 2013

Detergent for lithography and method of forming resist pattern with the same

TOKYO OHKA KOGYO CO LTD5 citations72
US6197102B1Mar 6, 2001

Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric thin films, ferroelectric capacitors and ferroelectric memories formed with said coating solutions, as well as processes for production thereof

TOKYO OHKA KOGYO CO LTD11 citations72
US7897325B2Mar 1, 2011

Lithographic rinse solution and method for forming patterned resist layer using the same

TOKYO OHKA KOGYO CO LTD2 citations62
US7811748B2Oct 12, 2010

Resist pattern forming method and composite rinse agent

TOKYO OHKA KOGYO CO LTD2 citations62
US6528172B2Mar 4, 2003

Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric thin films, ferroelectric capacitors and ferroelectric memories formed with said coating solutions, as well as processes for production thereof

TOKYO OHKA KOGYO CO LTD2 citations61
US11120993B2Sep 14, 2021

Diffusing agent composition and method of manufacturing semiconductor substrate

TOKYO OHKA KOGYO CO LTD0 citations56
US11773287B2Oct 3, 2023

Method for forming coating

TOKYO OHKA KOGYO CO LTD0 citations54
US9620354B2Apr 11, 2017

Method for manufacturing semiconductor substrate with diffusion agent composition

TOKYO OHKA KOGYO CO LTD1 citations52
US10525418B2Jan 7, 2020

Purification method for purifying liquid, purification method for purifying silicon compound-containing liquid, method for producing silylating agent liquid, film forming material or diffusing agent composition, filter medium and filter device

TOKYO OHKA KOGYO CO LTD0 citations51
US9831086B2Nov 28, 2017

Method for manufacturing semiconductor substrate

TOKYO OHKA KOGYO CO LTD1 citations51
US10242875B2Mar 26, 2019

Impurity diffusion agent composition and method for manufacturing semiconductor substrate

TOKYO OHKA KOGYO CO LTD0 citations50
US10242874B2Mar 26, 2019

Diffusing agent composition and method of manufacturing semiconductor substrate

TOKYO OHKA KOGYO CO LTD0 citations42
US10504732B2Dec 10, 2019

Impurity diffusion agent composition and method for manufacturing semiconductor substrate

TOKYO OHKA KOGYO CO LTD0 citations41

FUJITSU LTD

6 patents

NIPPON KAYAKU KK

2 patents

OKI ELECTRIC IND CO LTD

2 patents

AGENCY IND SCIENCE TECHN

1 patent

MITSUBISHI METAL CORP

1 patent

MITSUBISHI MATERIALS CORP

1 patent

KOSHIYAMA JUN

1 patent

NAGASE KENJI

1 patent

SAWADA YOSHIHIRO

1 patent