P

Inventor

MOTOKI KENSAKU

JP61 patents
⚠️ This page may combine multiple inventors who share the name “MOTOKI KENSAKU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SUMITOMO ELECTRIC INDUSTRIES

33 patents
US7968864B2Jun 28, 2011

Group-III nitride light-emitting device

SUMITOMO ELECTRIC INDUSTRIES254 citations99
US7303630B2Dec 4, 2007

Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate

SUMITOMO ELECTRIC INDUSTRIES291 citations99
US6693021B1Feb 17, 2004

GaN single crystal substrate and method of making the same

SUMITOMO ELECTRIC INDUSTRIES116 citations99
US6468882B2Oct 22, 2002

Method of producing a single crystal gallium nitride substrate and single crystal gallium nitride substrate

SUMITOMO ELECTRIC INDUSTRIES197 citations99
US6468347B1Oct 22, 2002

Method of growing single crystal GaN, method of making single crystal GaN substrate and single crystal GaN substrate

SUMITOMO ELECTRIC INDUSTRIES217 citations99
US6509651B1Jan 21, 2003

Substrate-fluorescent LED

SUMITOMO ELECTRIC INDUSTRIES188 citations98
US6413627B1Jul 2, 2002

GaN single crystal substrate and method of producing same

SUMITOMO ELECTRIC INDUSTRIES261 citations98
US7105865B2Sep 12, 2006

AlxInyGa1−x−yN mixture crystal substrate

SUMITOMO ELECTRIC INDUSTRIES50 citations96
US6773504B2Aug 10, 2004

Oxygen doping method to gallium nitride single crystal substrate and oxygen-doped N-type gallium nitride freestanding single crystal substrate

SUMITOMO ELECTRIC INDUSTRIES39 citations96
US6667184B2Dec 23, 2003

Single crystal GaN substrate, method of growing same and method of producing same

SUMITOMO ELECTRIC INDUSTRIES74 citations96
US5962875AOct 5, 1999

Light emitting device, wafer for light emitting device, and method of preparing the same

SUMITOMO ELECTRIC INDUSTRIES65 citations95
US5834325ANov 10, 1998

Light emitting device, wafer for light emitting device, and method of preparing the same

SUMITOMO ELECTRIC INDUSTRIES40 citations95
US7473315B2Jan 6, 2009

AlxInyGa1-x-yN mixture crystal substrate, method of growing AlxInyGa1-x-yN mixture crystal substrate and method of producing AlxInyGa1-x-yN mixture crystal substrate

SUMITOMO ELECTRIC INDUSTRIES23 citations93
US7112826B2Sep 26, 2006

Single crystal GaN substrate semiconductor device

SUMITOMO ELECTRIC INDUSTRIES29 citations93
US7087114B2Aug 8, 2006

Single crystal GaN substrate, method of growing single crystal GaN and method of producing single crystal GaN substrate

SUMITOMO ELECTRIC INDUSTRIES17 citations93
US7012318B2Mar 14, 2006

Oxygen-doped n-type gallium nitride freestanding single crystal substrate

SUMITOMO ELECTRIC INDUSTRIES22 citations93
US7589000B2Sep 15, 2009

Fabrication method and fabrication apparatus of group III nitride crystal substance

SUMITOMO ELECTRIC INDUSTRIES20 citations92
US5970314AOct 19, 1999

Process for vapor phase epitaxy of compound semiconductor

SUMITOMO ELECTRIC INDUSTRIES23 citations92
US7504323B2Mar 17, 2009

GaN single crystal substrate and method of making the same

SUMITOMO ELECTRIC INDUSTRIES10 citations84
US7091056B2Aug 15, 2006

Method of manufacturing a semiconductor light emitting device, semiconductor light emitting device, method of manufacturing a semiconductor device, semiconductor device, method of manufacturing a device, and device

SUMITOMO ELECTRIC INDUSTRIES12 citations84
US7919831B2Apr 5, 2011

Nitride semiconductor device having oxygen-doped N-type gallium nitride freestanding single crystal substrate

SUMITOMO ELECTRIC INDUSTRIES4 citations74
US7667298B2Feb 23, 2010

Oxygen-doped n-type gallium nitride freestanding single crystal substrate

SUMITOMO ELECTRIC INDUSTRIES7 citations74
US7357837B2Apr 15, 2008

GaN single crystal substrate and method of making the same

SUMITOMO ELECTRIC INDUSTRIES8 citations74
US7354477B2Apr 8, 2008

Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate

SUMITOMO ELECTRIC INDUSTRIES7 citations74
US7176499B2Feb 13, 2007

Method of manufacturing a semiconductor light emitting device, semiconductor light emitting device, method of manufacturing a semiconductor device, semiconductor device, method of manufacturing a device, and device

SUMITOMO ELECTRIC INDUSTRIES8 citations74
US7015058B2Mar 21, 2006

Method for fabricating a group III nitride semiconductor laser device

SUMITOMO ELECTRIC INDUSTRIES10 citations74
US6031252AFeb 29, 2000

Epitaxial wafer and method of preparing the same

SUMITOMO ELECTRIC INDUSTRIES11 citations73
US6270587B1Aug 7, 2001

Epitaxial wafer having a gallium nitride epitaxial layer deposited on semiconductor substrate and method for preparing the same

SUMITOMO ELECTRIC INDUSTRIES12 citations72
US7915635B2Mar 29, 2011

Semiconductor light-emitting element and substrate used in formation of the same

SUMITOMO ELECTRIC INDUSTRIES2 citations63
US7858502B2Dec 28, 2010

Fabrication method and fabrication apparatus of group III nitride crystal substance

SUMITOMO ELECTRIC INDUSTRIES4 citations63
US7794543B2Sep 14, 2010

Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate

SUMITOMO ELECTRIC INDUSTRIES3 citations63
US7534310B2May 19, 2009

Single crystal GaN substrate, method of growing single crystal GaN and method of producing single crystal GaN substrate

SUMITOMO ELECTRIC INDUSTRIES2 citations63
US7470970B2Dec 30, 2008

Oxygen-doped n-type gallium nitride freestanding single crystal substrate

SUMITOMO ELECTRIC INDUSTRIES1 citations63

SHARP KK

9 patents

HASHIMOTO SHIN

3 patents

NAKAHATA SEIJI

2 patents

SUMITO ELECTRIC IND LTD

1 patent

SONY CORP

1 patent

SUMITOMO ELECTRIC PRINTED CIRCUITS INC

1 patent

Showing the top 50 of 61 patents by PatentIndex Score.