Inventor
MOTOKI KENSAKU
JP61 patents
⚠️ This page may combine multiple inventors who share the name “MOTOKI KENSAKU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SUMITOMO ELECTRIC INDUSTRIES
33 patentsUS7968864B2Jun 28, 2011
Group-III nitride light-emitting device
SUMITOMO ELECTRIC INDUSTRIES254 citations99
US7303630B2Dec 4, 2007
Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate
SUMITOMO ELECTRIC INDUSTRIES291 citations99
US6693021B1Feb 17, 2004
GaN single crystal substrate and method of making the same
SUMITOMO ELECTRIC INDUSTRIES116 citations99
US6468882B2Oct 22, 2002
Method of producing a single crystal gallium nitride substrate and single crystal gallium nitride substrate
SUMITOMO ELECTRIC INDUSTRIES197 citations99
US6468347B1Oct 22, 2002
Method of growing single crystal GaN, method of making single crystal GaN substrate and single crystal GaN substrate
SUMITOMO ELECTRIC INDUSTRIES217 citations99
US6509651B1Jan 21, 2003
Substrate-fluorescent LED
SUMITOMO ELECTRIC INDUSTRIES188 citations98
US6413627B1Jul 2, 2002
GaN single crystal substrate and method of producing same
SUMITOMO ELECTRIC INDUSTRIES261 citations98
US7105865B2Sep 12, 2006
AlxInyGa1−x−yN mixture crystal substrate
SUMITOMO ELECTRIC INDUSTRIES50 citations96
US6773504B2Aug 10, 2004
Oxygen doping method to gallium nitride single crystal substrate and oxygen-doped N-type gallium nitride freestanding single crystal substrate
SUMITOMO ELECTRIC INDUSTRIES39 citations96
US6667184B2Dec 23, 2003
Single crystal GaN substrate, method of growing same and method of producing same
SUMITOMO ELECTRIC INDUSTRIES74 citations96
US5962875AOct 5, 1999
Light emitting device, wafer for light emitting device, and method of preparing the same
SUMITOMO ELECTRIC INDUSTRIES65 citations95
US5834325ANov 10, 1998
Light emitting device, wafer for light emitting device, and method of preparing the same
SUMITOMO ELECTRIC INDUSTRIES40 citations95
US7473315B2Jan 6, 2009
AlxInyGa1-x-yN mixture crystal substrate, method of growing AlxInyGa1-x-yN mixture crystal substrate and method of producing AlxInyGa1-x-yN mixture crystal substrate
SUMITOMO ELECTRIC INDUSTRIES23 citations93
US7112826B2Sep 26, 2006
Single crystal GaN substrate semiconductor device
SUMITOMO ELECTRIC INDUSTRIES29 citations93
US7087114B2Aug 8, 2006
Single crystal GaN substrate, method of growing single crystal GaN and method of producing single crystal GaN substrate
SUMITOMO ELECTRIC INDUSTRIES17 citations93
US7012318B2Mar 14, 2006
Oxygen-doped n-type gallium nitride freestanding single crystal substrate
SUMITOMO ELECTRIC INDUSTRIES22 citations93
US7589000B2Sep 15, 2009
Fabrication method and fabrication apparatus of group III nitride crystal substance
SUMITOMO ELECTRIC INDUSTRIES20 citations92
US5970314AOct 19, 1999
Process for vapor phase epitaxy of compound semiconductor
SUMITOMO ELECTRIC INDUSTRIES23 citations92
US7504323B2Mar 17, 2009
GaN single crystal substrate and method of making the same
SUMITOMO ELECTRIC INDUSTRIES10 citations84
US7091056B2Aug 15, 2006
Method of manufacturing a semiconductor light emitting device, semiconductor light emitting device, method of manufacturing a semiconductor device, semiconductor device, method of manufacturing a device, and device
SUMITOMO ELECTRIC INDUSTRIES12 citations84
US7919831B2Apr 5, 2011
Nitride semiconductor device having oxygen-doped N-type gallium nitride freestanding single crystal substrate
SUMITOMO ELECTRIC INDUSTRIES4 citations74
US7667298B2Feb 23, 2010
Oxygen-doped n-type gallium nitride freestanding single crystal substrate
SUMITOMO ELECTRIC INDUSTRIES7 citations74
US7357837B2Apr 15, 2008
GaN single crystal substrate and method of making the same
SUMITOMO ELECTRIC INDUSTRIES8 citations74
US7354477B2Apr 8, 2008
Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate
SUMITOMO ELECTRIC INDUSTRIES7 citations74
US7176499B2Feb 13, 2007
Method of manufacturing a semiconductor light emitting device, semiconductor light emitting device, method of manufacturing a semiconductor device, semiconductor device, method of manufacturing a device, and device
SUMITOMO ELECTRIC INDUSTRIES8 citations74
US7015058B2Mar 21, 2006
Method for fabricating a group III nitride semiconductor laser device
SUMITOMO ELECTRIC INDUSTRIES10 citations74
US6031252AFeb 29, 2000
Epitaxial wafer and method of preparing the same
SUMITOMO ELECTRIC INDUSTRIES11 citations73
US6270587B1Aug 7, 2001
Epitaxial wafer having a gallium nitride epitaxial layer deposited on semiconductor substrate and method for preparing the same
SUMITOMO ELECTRIC INDUSTRIES12 citations72
US7915635B2Mar 29, 2011
Semiconductor light-emitting element and substrate used in formation of the same
SUMITOMO ELECTRIC INDUSTRIES2 citations63
US7858502B2Dec 28, 2010
Fabrication method and fabrication apparatus of group III nitride crystal substance
SUMITOMO ELECTRIC INDUSTRIES4 citations63
US7794543B2Sep 14, 2010
Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate
SUMITOMO ELECTRIC INDUSTRIES3 citations63
US7534310B2May 19, 2009
Single crystal GaN substrate, method of growing single crystal GaN and method of producing single crystal GaN substrate
SUMITOMO ELECTRIC INDUSTRIES2 citations63
US7470970B2Dec 30, 2008
Oxygen-doped n-type gallium nitride freestanding single crystal substrate
SUMITOMO ELECTRIC INDUSTRIES1 citations63
SHARP KK
9 patentsUS7579627B2Aug 25, 2009
Nitride semiconductor light-emitting device, method of fabricating it, and semiconductor optical apparatus
SHARP KK14 citations92
US7498608B2Mar 3, 2009
Nitride-composite semiconductor laser element, its manufacturing method, and semiconductor optical device
SHARP KK20 citations92
US7462882B2Dec 9, 2008
Nitride semiconductor light-emitting device, method of fabricating it, and semiconductor optical apparatus
SHARP KK20 citations92
US6812496B2Nov 2, 2004
Group III nitride semiconductor laser device
SHARP KK23 citations92
US7692200B2Apr 6, 2010
Nitride semiconductor light-emitting device
SHARP KK11 citations83
US7858992B2Dec 28, 2010
Nitride semiconductor light-emitting device, method of fabricating it, and semiconductor optical apparatus
SHARP KK5 citations74
US7781244B2Aug 24, 2010
Method of manufacturing nitride-composite semiconductor laser element, with disclocation control
SHARP KK1 citations63
US7903710B2Mar 8, 2011
Nitride semiconductor light-emitting device
SHARP KK1 citations62
US7903707B2Mar 8, 2011
Nitride semiconductor light-emitting device
SHARP KK1 citations62
HASHIMOTO SHIN
3 patentsUS8679955B2Mar 25, 2014
Method for forming epitaxial wafer and method for fabricating semiconductor device
HASHIMOTO SHIN2 citations62
US8592289B2Nov 26, 2013
Epitaxial wafer, method for manufacturing gallium nitride semiconductor device, gallium nitride semiconductor device and gallium oxide wafer
HASHIMOTO SHIN4 citations62
US8415180B2Apr 9, 2013
Method for fabricating wafer product and method for fabricating gallium nitride based semiconductor optical device
HASHIMOTO SHIN2 citations62
NAKAHATA SEIJI
2 patentsSUMITO ELECTRIC IND LTD
1 patentSONY CORP
1 patentSUMITOMO ELECTRIC PRINTED CIRCUITS INC
1 patentShowing the top 50 of 61 patents by PatentIndex Score.