Inventor
SHIRASAKI TORU
JP37 patents
⚠️ This page may combine multiple inventors who share the name “SHIRASAKI TORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
20 patentsUS6639650B2Oct 28, 2003
Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane
SHINETSU CHEMICAL CO20 citations92
US6593034B1Jul 15, 2003
Framed pellicle for protection of photolithographic photomask
SHINETSU CHEMICAL CO41 citations92
US6368683B1Apr 9, 2002
Pellicle for photolithography
SHINETSU CHEMICAL CO18 citations92
US5693382ADec 2, 1997
Frame-supported pellicle for dustproof protection of photomask in photolithography
SHINETSU CHEMICAL CO36 citations92
US5616927AApr 1, 1997
Frame-supported pellicle for dustproof protection of photomask
SHINETSU CHEMICAL CO30 citations92
US5470621ANov 28, 1995
Frame-supported pellicle for dustproof protection of photomask
SHINETSU CHEMICAL CO34 citations91
US6803161B2Oct 12, 2004
Framed pellicle for protection of photolithographic photomask
SHINETSU CHEMICAL CO9 citations74
US8356849B2Jan 22, 2013
Pellicle handling tool
SHINETSU CHEMICAL CO5 citations73
US10088745B2Oct 2, 2018
Pellicle for EUV exposure
SHINETSU CHEMICAL CO3 citations72
US8383297B2Feb 26, 2013
Pellicle for lithography and method for manufacturing pellicle film
SHINETSU CHEMICAL CO5 citations72
US5419972AMay 30, 1995
Frame-supported pellicle for dustproof protection of photomask
SHINETSU CHEMICAL CO15 citations72
US7901841B2Mar 8, 2011
Pellicle for photolithography
SHINETSU CHEMICAL CO5 citations63
US6977126B2Dec 20, 2005
Pellicle, photomask, pellicle frame, and method for manufacturing pellicle
SHINETSU CHEMICAL CO3 citations63
US6806990B2Oct 19, 2004
Optical device and method for producing optical device
SHINETSU CHEMICAL CO6 citations62
US10634991B2Apr 28, 2020
Container for storing a pellicle for lithography
SHINETSU CHEMICAL CO0 citations52
US9817308B2Nov 14, 2017
Pellicle
SHINETSU CHEMICAL CO0 citations52
US9268213B2Feb 23, 2016
Pellicle for lithogrpahy
SHINETSU CHEMICAL CO0 citations52
US8349526B2Jan 8, 2013
Pellicle for lithography
SHINETSU CHEMICAL CO1 citations52
US7968252B2Jun 28, 2011
Pellicle frame
SHINETSU CHEMICAL CO1 citations52
US7914952B2Mar 29, 2011
Lithographic pellicle
SHINETSU CHEMICAL CO1 citations52
SHIRASAKI TORU
10 patentsUS8221944B2Jul 17, 2012
Pellicle frame and lithographic pellicle
SHIRASAKI TORU8 citations80
US8652711B2Feb 18, 2014
Pellicle for lithography
SHIRASAKI TORU3 citations62
US8582077B2Nov 12, 2013
Pellicle, mounting method therefor, pellicle-equipped mask, and mask
SHIRASAKI TORU2 citations62
US8394557B2Mar 12, 2013
Lithographic pellicle
SHIRASAKI TORU2 citations62
US8173330B2May 8, 2012
Pellicle
SHIRASAKI TORU4 citations62
US8221945B2Jul 17, 2012
Pellicle frame and lithographic pellicle
SHIRASAKI TORU5 citations58
US8426084B2Apr 23, 2013
Pellicle for lithography
SHIRASAKI TORU0 citations52
US8426083B2Apr 23, 2013
Pellicle for lithography
SHIRASAKI TORU0 citations51
US8309279B2Nov 13, 2012
Pellicle for lithography
SHIRASAKI TORU0 citations51
US8467035B2Jun 18, 2013
Pellicle frame and lithographic pellicle
SHIRASAKI TORU0 citations48
SEIKO EPSON CORP
2 patentsUS7311378B2Dec 25, 2007
Wiping apparatus and imaging apparatus provided therewith, method of manufacturing electro-optical device, electro-optical device, and electronic apparatus
SEIKO EPSON CORP28 citations92
US6736252B2May 18, 2004
Work holder for through hole examination apparatus
SEIKO EPSON CORP3 citations63