Inventor
SAXLER ADAM WILLIAM
US53 patents
⚠️ This page may combine multiple inventors who share the name “SAXLER ADAM WILLIAM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CREE INC
34 patentsUS7875910B2Jan 25, 2011
Integrated nitride and silicon carbide-based devices
CREE INC123 citations99
US7544963B2Jun 9, 2009
Binary group III-nitride based high electron mobility transistors
CREE INC174 citations99
US7112860B2Sep 26, 2006
Integrated nitride-based acoustic wave devices and methods of fabricating integrated nitride-based acoustic wave devices
CREE INC142 citations99
US7030428B2Apr 18, 2006
Strain balanced nitride heterojunction transistors
CREE INC223 citations99
US6982204B2Jan 3, 2006
Nitride-based transistors and methods of fabrication thereof using non-etched contact recesses
CREE INC205 citations99
US7901994B2Mar 8, 2011
Methods of manufacturing group III nitride semiconductor devices with silicon nitride layers
CREE INC91 citations98
US7709859B2May 4, 2010
Cap layers including aluminum nitride for nitride-based transistors
CREE INC108 citations98
US7615774B2Nov 10, 2009
Aluminum free group III-nitride based high electron mobility transistors
CREE INC113 citations98
US7612390B2Nov 3, 2009
Heterojunction transistors including energy barriers
CREE INC87 citations98
US7550784B2Jun 23, 2009
Nitride-based transistors and methods of fabrication thereof using non-etched contact recesses
CREE INC75 citations98
US7465967B2Dec 16, 2008
Group III nitride field effect transistors (FETS) capable of withstanding high temperature reverse bias test conditions
CREE INC94 citations98
US7456443B2Nov 25, 2008
Transistors having buried n-type and p-type regions beneath the source region
CREE INC80 citations98
US7432142B2Oct 7, 2008
Methods of fabricating nitride-based transistors having regrown ohmic contact regions
CREE INC116 citations98
US7253454B2Aug 7, 2007
High electron mobility transistor
CREE INC79 citations98
US7170111B2Jan 30, 2007
Nitride heterojunction transistors having charge-transfer induced energy barriers and methods of fabricating the same
CREE INC118 citations98
US7161194B2Jan 9, 2007
High power density and/or linearity transistors
CREE INC114 citations98
US7084441B2Aug 1, 2006
Semiconductor devices having a hybrid channel layer, current aperture transistors and methods of fabricating same
CREE INC109 citations98
US6841001B2Jan 11, 2005
Strain compensated semiconductor structures and methods of fabricating strain compensated semiconductor structures
CREE INC53 citations96
US7271416B2Sep 18, 2007
Strain compensated semiconductor structures
CREE INC20 citations93
US8362503B2Jan 29, 2013
Thick nitride semiconductor structures with interlayer structures
CREE INC34 citations92
US7825432B2Nov 2, 2010
Nitride semiconductor structures with interlayer structures
CREE INC16 citations92
US7022378B2Apr 4, 2006
Nitrogen passivation of interface states in SiO2/SiC structures
CREE INC20 citations92
US7626217B2Dec 1, 2009
Composite substrates of conductive and insulating or semi-insulating group III-nitrides for group III-nitride devices
CREE INC12 citations84
US7355215B2Apr 8, 2008
Field effect transistors (FETs) having multi-watt output power at millimeter-wave frequencies
CREE INC15 citations84
US7135715B2Nov 14, 2006
Co-doping for fermi level control in semi-insulating Group III nitrides
CREE INC14 citations84
US7579626B2Aug 25, 2009
Silicon carbide layer on diamond substrate for supporting group III nitride heterostructure device
CREE INC5 citations74
US7662682B2Feb 16, 2010
Highly uniform group III nitride epitaxial layers on 100 millimeter diameter silicon carbide substrates
CREE INC5 citations72
US7863624B2Jan 4, 2011
Silicon carbide on diamond substrates and related devices and methods
CREE INC2 citations63
US7479669B2Jan 20, 2009
Current aperture transistors and methods of fabricating same
CREE INC4 citations63
US7449353B2Nov 11, 2008
Co-doping for fermi level control in semi-insulating Group III nitrides
CREE INC3 citations63
US9054017B2Jun 9, 2015
Thick nitride semiconductor structures with interlayer structures and methods of fabricating thick nitride semiconductor structures
CREE INC3 citations62
US7405430B2Jul 29, 2008
Highly uniform group III nitride epitaxial layers on 100 millimeter diameter silicon carbide substrates
CREE INC3 citations61
US9224596B2Dec 29, 2015
Methods of fabricating thick semi-insulating or insulating epitaxial gallium nitride layers
CREE INC1 citations52
US9142617B2Sep 22, 2015
Wide bandgap device having a buffer layer disposed over a diamond substrate
CREE INC0 citations52
SAXLER ADAM WILLIAM
10 patentsUS8153515B2Apr 10, 2012
Methods of fabricating strain balanced nitride heterojunction transistors
SAXLER ADAM WILLIAM36 citations92
US9040398B2May 26, 2015
Method of fabricating seminconductor devices including self aligned refractory contacts
SAXLER ADAM WILLIAM5 citations73
US9035354B2May 19, 2015
Heterojunction transistors having barrier layer bandgaps greater than channel layer bandgaps and related methods
SAXLER ADAM WILLIAM4 citations73
US8628622B2Jan 14, 2014
Gas driven rotation apparatus and method for forming crystalline layers
SAXLER ADAM WILLIAM5 citations73
US8575651B2Nov 5, 2013
Devices having thick semi-insulating epitaxial gallium nitride layer
SAXLER ADAM WILLIAM3 citations63
US8513672B2Aug 20, 2013
Wafer precursor prepared for group III nitride epitaxial growth on a composite substrate having diamond and silicon carbide layers, and semiconductor laser formed thereon
SAXLER ADAM WILLIAM2 citations63
US8481376B2Jul 9, 2013
Group III nitride semiconductor devices with silicon nitride layers and methods of manufacturing such devices
SAXLER ADAM WILLIAM4 citations63
US8324005B2Dec 4, 2012
Methods of fabricating nitride semiconductor structures with interlayer structures
SAXLER ADAM WILLIAM3 citations61
US9331192B2May 3, 2016
Low dislocation density group III nitride layers on silicon carbide substrates and methods of making the same
SAXLER ADAM WILLIAM0 citations52
US9166033B2Oct 20, 2015
Methods of passivating surfaces of wide bandgap semiconductor devices
SAXLER ADAM WILLIAM1 citations52
DRISCOLL DANIEL CARLETON
2 patentsSMITH RICHARD PETER
2 patentsUS8212289B2Jul 3, 2012
Group III nitride field effect transistors (FETS) capable of withstanding high temperature reverse bias test conditions
SMITH RICHARD PETER5 citations71
US8803198B2Aug 12, 2014
Group III nitride field effect transistors (FETS) capable of withstanding high temperature reverse bias test conditions
SMITH RICHARD PETER1 citations60
INTEL CORP
1 patentSHEPPARD SCOTT T
1 patentShowing the top 50 of 53 patents by PatentIndex Score.