Inventor
OHSAWA YOUICHI
JP89 patents
⚠️ This page may combine multiple inventors who share the name “OHSAWA YOUICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
34 patentsUS7569326B2Aug 4, 2009
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO129 citations98
US6916591B2Jul 12, 2005
Photoacid generators, chemically amplified resist compositions, and patterning process
SHINETSU CHEMICAL CO79 citations98
US7511169B2Mar 31, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO45 citations96
US6673511B1Jan 6, 2004
Resist composition
SHINETSU CHEMICAL CO48 citations96
US6440634B1Aug 27, 2002
Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process
SHINETSU CHEMICAL CO76 citations96
US8361693B2Jan 29, 2013
Chemically amplified positive photoresist composition and pattern forming process
SHINETSU CHEMICAL CO32 citations93
US8048610B2Nov 1, 2011
Sulfonium salt-containing polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO32 citations93
US7919226B2Apr 5, 2011
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO19 citations93
US7670751B2Mar 2, 2010
Photoacid generator, resist composition, and patterning process
SHINETSU CHEMICAL CO26 citations93
US7569324B2Aug 4, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO18 citations93
US7527912B2May 5, 2009
Photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO38 citations93
US7514202B2Apr 7, 2009
Thermal acid generator, resist undercoat material and patterning process
SHINETSU CHEMICAL CO37 citations93
US7459261B2Dec 2, 2008
Resist composition and patterning process using the same
SHINETSU CHEMICAL CO28 citations93
US7090961B2Aug 15, 2006
Photo acid generator, chemical amplification resist material and pattern formation method
SHINETSU CHEMICAL CO18 citations93
US6916593B2Jul 12, 2005
Resist composition
SHINETSU CHEMICAL CO33 citations93
US6692893B2Feb 17, 2004
Onium salts, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO29 citations93
US6551758B2Apr 22, 2003
Onium salts, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO25 citations93
US6420085B1Jul 16, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO22 citations93
US6416928B1Jul 9, 2002
Onium salts, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO41 citations93
US6338931B1Jan 15, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO35 citations93
US6689530B2Feb 10, 2004
Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
SHINETSU CHEMICAL CO21 citations92
US6395446B1May 28, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO24 citations92
US5847218ADec 8, 1998
Sulfonium salts and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO39 citations92
US5679496AOct 21, 1997
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO28 citations92
US5569784AOct 29, 1996
Sulfonium salt and resist composition
SHINETSU CHEMICAL CO29 citations92
US8349533B2Jan 8, 2013
Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
SHINETSU CHEMICAL CO14 citations84
US8039198B2Oct 18, 2011
Sulfonium salt-containing polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO12 citations84
US7977027B2Jul 12, 2011
Resist composition and patterning process
SHINETSU CHEMICAL CO15 citations84
US7629108B2Dec 8, 2009
Nitrogen-containing organic compound, resist composition and patterning process
SHINETSU CHEMICAL CO16 citations84
US7556909B2Jul 7, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO9 citations84
US7531290B2May 12, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO17 citations84
US7312016B2Dec 25, 2007
Chemically amplified positive resist composition and patterning process
SHINETSU CHEMICAL CO11 citations84
US6541179B2Apr 1, 2003
Resist compositions and patterning process
SHINETSU CHEMICAL CO13 citations84
US6156481ADec 5, 2000
Positive resist composition
SHINETSU CHEMICAL CO17 citations84
OHASHI MASAKI
5 patentsUS8105748B2Jan 31, 2012
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
OHASHI MASAKI81 citations98
US8057985B2Nov 15, 2011
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
OHASHI MASAKI52 citations94
US8114571B2Feb 14, 2012
Photoacid generator, resist composition, and patterning process
OHASHI MASAKI29 citations92
US8394570B2Mar 12, 2013
Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process
OHASHI MASAKI12 citations84
US8283104B2Oct 9, 2012
Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same
OHASHI MASAKI14 citations84
OHSAWA YOUICHI
5 patentsUS8785105B2Jul 22, 2014
Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
OHSAWA YOUICHI17 citations92
US8173354B2May 8, 2012
Sulfonium salt, resist composition, and patterning process
OHSAWA YOUICHI23 citations92
US8535869B2Sep 17, 2013
Sulfonium salt, resist composition, and patterning process
OHSAWA YOUICHI7 citations84
US8114570B2Feb 14, 2012
Photoacid generator, resist composition, and patterning process
OHSAWA YOUICHI15 citations84
US8062828B2Nov 22, 2011
Positive resist composition and patterning process
OHSAWA YOUICHI11 citations84
KOBAYASHI TOMOHIRO
2 patentsHATAKEYAMA JUN
2 patentsMASUNAGA KEIICHI
1 patentTAKEDA TAKANOBU
1 patentShowing the top 50 of 89 patents by PatentIndex Score.