Inventor

PALLEM VENKATESWARA R

US36 patents

⚠️ This page may combine multiple inventors who share the name “PALLEM VENKATESWARA R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PALLEM VENKATESWARA R

AIR LIQUIDE AMERICAN

Sulfur containing organosilane precursors for ALD/CVD silicon-containing film applications

Organosilane precursors for ALD/CVD silicon-containing film applications

Gases for low damage selective silicon nitride etching

Preparation of cerium-containing precursors and deposition of cerium-containing films

Method to improve profile control during selective etching of silicon nitride spacers

Nitrogen-containing compounds for etching semiconductor structures

Synthesis methods for amino(halo)silanes

Hexacoordinate silicon-containing precursors for ALD/CVD silicon-containing film applications

Atomic layer or cyclic plasma etching chemistries and processes

Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films

Iodine-containing compounds for etching semiconductor structures

Iodine-containing compounds for etching semiconductor structures

Nitrogen-containing compounds for etching semiconductor structures

Method of etching semiconductor structures with etch gas

Carbosilane substituted amine precursors for deposition of Si-containing films and methods thereof

Preparation of cerium-containing precursor and deposition of cerium-containing films

Method to improve profile control during selective etching of silicon nitride spacers

Method to improve profile control during selective etching of silicon nitride spacers

Method to improve profile control during selective etching of silicon nitride spacers

Indium precursors for vapor depositions

Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications

Organosilane precursors for ALD/CVD silicon-containing film applications

Organosilane precursors for ALD/CVD silicon-containing film applications

Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films

Titanium-containing precursors for vapor deposition

Method of etching semiconductor structures with etch gas

Silicon-based self-assembling monolayer compositions and surface preparation using the same

Organodisilane precursors for ALD/CVD silicon-containing film applications

PALLEM VENKATESWARA R

Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films

Titanium-containing precursors for vapor deposition

Hafnium-containing and zirconium-containing precursors for vapor deposition

AIR LIQUIDE

Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films

Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processes

DUSSARRAT CHRISTIAN

Methods of making and deposition methods using hafnium- or zirconium-containing compounds

Hafnium- and zirconium-containing precursors and methods of using the same

KOROLEV ANDREY V

Synthesis method for copper compounds