Inventor
WEINER KURT
US28 patents
⚠️ This page may combine multiple inventors who share the name “WEINER KURT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ENDO RICK
7 patentsUS8770143B2Jul 8, 2014
Multi-region processing system
ENDO RICK19 citations92
US8932995B2Jan 13, 2015
Combinatorial process system
ENDO RICK1 citations62
US8771483B2Jul 8, 2014
Combinatorial process system
ENDO RICK2 citations62
US8449678B2May 28, 2013
Combinatorial process system
ENDO RICK2 citations62
US8387563B2Mar 5, 2013
Combinatorial process system
ENDO RICK1 citations62
US8317925B2Nov 27, 2012
Method and system for mask handling in high productivity chamber
ENDO RICK2 citations61
US8758581B2Jun 24, 2014
Combinatorial process system
ENDO RICK0 citations51
INTERMOLECULAR INC
6 patentsUS7824935B2Nov 2, 2010
Methods of combinatorial processing for screening multiple samples on a semiconductor substrate
INTERMOLECULAR INC25 citations92
US8881677B2Nov 11, 2014
Shadow mask for patterned deposition on substrates
INTERMOLECULAR INC10 citations84
US8037894B1Oct 18, 2011
Maintaining flow rate of a fluid
INTERMOLECULAR INC11 citations84
US7993461B2Aug 9, 2011
Method and system for mask handling in high productivity chamber
INTERMOLECULAR INC8 citations83
US8039052B2Oct 18, 2011
Multi-region processing system and heads
INTERMOLECULAR INC5 citations73
US8349143B2Jan 8, 2013
Shadow masks for patterned deposition on substrates
INTERMOLECULAR INC0 citations52
ULTRATECH STEPPER INC
5 patentsUS5908307AJun 1, 1999
Fabrication method for reduced-dimension FET devices
ULTRATECH STEPPER INC138 citations97
US5888888AMar 30, 1999
Method for forming a silicide region on a silicon body
ULTRATECH STEPPER INC122 citations97
US5956603ASep 21, 1999
Gas immersion laser annealing method suitable for use in the fabrication of reduced-dimension integrated circuits
ULTRATECH STEPPER INC83 citations96
US6387803B2May 14, 2002
Method for forming a silicide region on a silicon body
ULTRATECH STEPPER INC37 citations92
US6297135B1Oct 2, 2001
Method for forming silicide regions on an integrated device
ULTRATECH STEPPER INC42 citations92