Inventor
VUONG VI
US40 patents
⚠️ This page may combine multiple inventors who share the name “VUONG VI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
21 patentsUS7327475B1Feb 5, 2008
Measuring a process parameter of a semiconductor fabrication process using optical metrology
TOKYO ELECTRON LTD19 citations92
US10910201B1Feb 2, 2021
Synthetic wavelengths for endpoint detection in plasma etching
TOKYO ELECTRON LTD7 citations84
US7588949B2Sep 15, 2009
Optical metrology model optimization based on goals
TOKYO ELECTRON LTD11 citations84
US7526354B2Apr 28, 2009
Managing and using metrology data for process and equipment control
TOKYO ELECTRON LTD10 citations84
US7417750B2Aug 26, 2008
Consecutive measurement of structures formed on a semiconductor wafer using an angle-resolved spectroscopic scatterometer
TOKYO ELECTRON LTD11 citations84
US9330990B2May 3, 2016
Method of endpoint detection of plasma etching process using multivariate analysis
TOKYO ELECTRON LTD10 citations82
US7783669B2Aug 24, 2010
Data flow management in generating profile models used in optical metrology
TOKYO ELECTRON LTD11 citations82
US10692705B2Jun 23, 2020
Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber
TOKYO ELECTRON LTD5 citations71
US10002804B2Jun 19, 2018
Method of endpoint detection of plasma etching process using multivariate analysis
TOKYO ELECTRON LTD5 citations71
US7616325B2Nov 10, 2009
Optical metrology optimization for repetitive structures
TOKYO ELECTRON LTD3 citations63
US7525673B2Apr 28, 2009
Optimizing selected variables of an optical metrology system
TOKYO ELECTRON LTD5 citations63
US7522295B2Apr 21, 2009
Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer
TOKYO ELECTRON LTD4 citations63
US7522294B2Apr 21, 2009
Measuring a process parameter of a semiconductor fabrication process using optical metrology
TOKYO ELECTRON LTD5 citations63
US7523021B2Apr 21, 2009
Weighting function to enhance measured diffraction signals in optical metrology
TOKYO ELECTRON LTD4 citations63
US7495781B2Feb 24, 2009
Optimizing selected variables of an optical metrology model
TOKYO ELECTRON LTD2 citations63
US7428044B2Sep 23, 2008
Drift compensation for an optical metrology tool
TOKYO ELECTRON LTD3 citations62
US8346506B2Jan 1, 2013
Transforming metrology data from a semiconductor treatment system using multivariate analysis
TOKYO ELECTRON LTD4 citations60
US7505148B2Mar 17, 2009
Matching optical metrology tools using spectra enhancement
TOKYO ELECTRON LTD1 citations52
US7765076B2Jul 27, 2010
Allocating processing units to processing clusters to generate simulated diffraction signals
TOKYO ELECTRON LTD0 citations40
US7765234B2Jul 27, 2010
Data flow management in generating different signal formats used in optical metrology
TOKYO ELECTRON LTD0 citations40
US7742888B2Jun 22, 2010
Allocating processing units to generate simulated diffraction signals used in optical metrology
TOKYO ELECTRON LTD0 citations40
TIMBRE TECH INC
15 patentsUS7330279B2Feb 12, 2008
Model and parameter selection for optical metrology
TIMBRE TECH INC58 citations98
US6609086B1Aug 19, 2003
Profile refinement for integrated circuit metrology
TIMBRE TECH INC113 citations98
US7126700B2Oct 24, 2006
Parametric optimization of optical metrology model
TIMBRE TECH INC59 citations96
US7092110B2Aug 15, 2006
Optimized model and parameter selection for optical metrology
TIMBRE TECH INC68 citations95
US7171284B2Jan 30, 2007
Optical metrology model optimization based on goals
TIMBRE TECH INC49 citations93
US7388677B2Jun 17, 2008
Optical metrology optimization for repetitive structures
TIMBRE TECH INC26 citations92
US6853942B2Feb 8, 2005
Metrology hardware adaptation with universal library
TIMBRE TECH INC20 citations92
US7467064B2Dec 16, 2008
Transforming metrology data from a semiconductor treatment system using multivariate analysis
TIMBRE TECH INC16 citations90
US7216045B2May 8, 2007
Selection of wavelengths for integrated circuit optical metrology
TIMBRE TECH INC22 citations90
US7474420B2Jan 6, 2009
In-die optical metrology
TIMBRE TECH INC11 citations84
US6842261B2Jan 11, 2005
Integrated circuit profile value determination
TIMBRE TECH INC14 citations84
US7394554B2Jul 1, 2008
Selecting a hypothetical profile to use in optical metrology
TIMBRE TECH INC10 citations82
US7505153B2Mar 17, 2009
Model and parameter selection for optical metrology
TIMBRE TECH INC5 citations74
US7515282B2Apr 7, 2009
Modeling and measuring structures with spatially varying properties in optical metrology
TIMBRE TECH INC5 citations62
US7474993B2Jan 6, 2009
Selection of wavelengths for integrated circuit optical metrology
TIMBRE TECH INC0 citations51
JIN WEN
3 patentsUS8577820B2Nov 5, 2013
Accurate and fast neural network training for library-based critical dimension (CD) metrology
JIN WEN8 citations83
US8452718B2May 28, 2013
Determination of training set size for a machine learning system
JIN WEN9 citations83
US9607265B2Mar 28, 2017
Accurate and fast neural network training for library-based critical dimension (CD) metrology
JIN WEN5 citations72