Inventor
DREGE EMMANUEL
US18 patents
⚠️ This page may combine multiple inventors who share the name “DREGE EMMANUEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TIMBRE TECH INC
9 patentsUS7330279B2Feb 12, 2008
Model and parameter selection for optical metrology
TIMBRE TECH INC58 citations98
US7171284B2Jan 30, 2007
Optical metrology model optimization based on goals
TIMBRE TECH INC49 citations93
US7046375B2May 16, 2006
Edge roughness measurement in optical metrology
TIMBRE TECH INC41 citations92
US6853942B2Feb 8, 2005
Metrology hardware adaptation with universal library
TIMBRE TECH INC20 citations92
US7216045B2May 8, 2007
Selection of wavelengths for integrated circuit optical metrology
TIMBRE TECH INC22 citations90
US6842261B2Jan 11, 2005
Integrated circuit profile value determination
TIMBRE TECH INC14 citations84
US7394554B2Jul 1, 2008
Selecting a hypothetical profile to use in optical metrology
TIMBRE TECH INC10 citations82
US7505153B2Mar 17, 2009
Model and parameter selection for optical metrology
TIMBRE TECH INC5 citations74
US7474993B2Jan 6, 2009
Selection of wavelengths for integrated circuit optical metrology
TIMBRE TECH INC0 citations51
TOKYO ELECTRON LTD
3 patentsUS7831528B2Nov 9, 2010
Optical metrology of structures formed on semiconductor wafers using machine learning systems
TOKYO ELECTRON LTD29 citations92
US7588949B2Sep 15, 2009
Optical metrology model optimization based on goals
TOKYO ELECTRON LTD11 citations84
US7523076B2Apr 21, 2009
Selecting a profile model for use in optical metrology using a machine learning system
TOKYO ELECTRON LTD13 citations84
CHAN KEVIN
3 patentsUS8407630B1Mar 26, 2013
Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing
CHAN KEVIN11 citations82
US8146024B2Mar 27, 2012
Method and system for process optimization
CHAN KEVIN4 citations61
US8156450B2Apr 10, 2012
Method and system for mask optimization
CHAN KEVIN1 citations51
CADENCE DESIGN SYSTEMS INC
2 patentsUS7694244B2Apr 6, 2010
Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing
CADENCE DESIGN SYSTEMS INC19 citations92
US7665048B2Feb 16, 2010
Method and system for inspection optimization in design and production of integrated circuits
CADENCE DESIGN SYSTEMS INC8 citations83