Inventor

BAO JUNWEI

US130 patents

⚠️ This page may combine multiple inventors who share the name “BAO JUNWEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BAO JUNWEI

TIMBRE TECH INC

Metrology hardware specification using a hardware simulator

Model and parameter selection for optical metrology

Profile refinement for integrated circuit metrology

Examining a structure formed on a semiconductor wafer using machine learning systems

Parametric optimization of optical metrology model

Generic interface for an optical metrology system

Optical metrology of single features

Optical metrology model optimization based on goals

Generation and use of integrated circuit profile-based simulation information

Optical metrology optimization for repetitive structures

Metrology hardware adaptation with universal library

Transforming metrology data from a semiconductor treatment system using multivariate analysis

Selection of wavelengths for integrated circuit optical metrology

Optical metrology model optimization for repetitive structures

In-die optical metrology

Generic interface for an optical metrology system

Library accuracy enhancement and evaluation

Optical metrology of single features

Integrated circuit profile value determination

Selecting a hypothetical profile to use in optical metrology

Model and parameter selection for optical metrology

Optical metrology of single features

Generic interface for an optical metrology system

TOKYO ELECTRON LTD

Optical metrology of structures formed on semiconductor wafers using machine learning systems

Controlling a fabrication tool using support vector machine

Optical metrology model optimization based on goals

Generation and use of integrated circuit profile-based simulation information

Controlling a fabrication tool using support vector machine

Managing and using metrology data for process and equipment control

Selecting a profile model for use in optical metrology using a machine learning system

Consecutive measurement of structures formed on a semiconductor wafer using an angle-resolved spectroscopic scatterometer

Data flow management in generating profile models used in optical metrology

Automated process control using optical metrology and a correlation between profile models and key profile shape variables

Evaluating a profile model to characterize a structure to be examined using optical metrology

Library accuracy enhancment and evaluation

INNOVUSION IRELAND LTD

MEMS beam steering and fisheye receiving lens for LiDAR system

Method and system for encoding and decoding LiDAR

High resolution LiDAR using high frequency pulse firing

2D scanning high precision LiDAR using combination of rotating concave mirror and beam steering devices

Multiwavelength LiDAR design

Ultrashort pulses in LiDAR systems

2D scanning high precision LiDAR using combination of rotating concave mirror and beam steering devices

Systems and method for debris and water obfuscation compensation for use in LiDAR systems

Systems and methods for tuning filters for use in lidar systems

LiDAR safety systems and methods

LiDAR systems and methods for exercising precise control of a fiber laser

ADVANCED MICRO DEVICES INC

System to determine suitability of sion arc surface for DUV resist patterning

JIN WEN

Accurate and fast neural network training for library-based critical dimension (CD) metrology

VUONG VI

Transforming metrology data from a semiconductor treatment system using multivariate analysis

INNOVUSION INC

2D scanning high precision LiDAR using combination of rotating concave mirror and beam steering devices