P

Inventor

BIH SHIH WEI

TW17 patents

Patents

17 patents
US10446662B2Oct 15, 2019

Reducing metal gate overhang by forming a top-wide bottom-narrow dummy gate electrode

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations81
US10916517B2Feb 9, 2021

Redistribution layer metallic structure and method

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10658315B2May 19, 2020

Redistribution layer metallic structure and method

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10354965B2Jul 16, 2019

Bonding pad process with protective layer

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12125783B2Oct 22, 2024

Interconnect structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12040293B2Jul 16, 2024

Redistribution layer metallic structure and method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11664308B2May 30, 2023

Interconnect structure and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11502050B2Nov 15, 2022

Redistribution layer metallic structure and method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11177365B2Nov 16, 2021

Semiconductor device with adhesion layer

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11164957B2Nov 2, 2021

Semiconductor device with adhesion layer and method of making

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11081341B2Aug 3, 2021

Apparatus for fabricating a semiconductor device with target sputtering and target sputtering method for fabricating the semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10923416B2Feb 16, 2021

Interconnect structure with insulation layer and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12180576B2Dec 31, 2024

PVD target design and semiconductor devices formed using the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12142664B2Nov 12, 2024

Reducing metal gate overhang by forming a top-wide bottom-narrow dummy gate electrode

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11725270B2Aug 15, 2023

PVD target design and semiconductor devices formed using the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US10490649B2Nov 26, 2019

Method of fabricating semiconductor device with adhesion layer

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9803274B2Oct 31, 2017

Process kit of physical vapor deposition chamber and fabricating method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48