Inventor

WANG CHIEN-WEI

TW54 patents

⚠️ This page may combine multiple inventors who share the name “WANG CHIEN-WEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WANG CHIEN-WEI

TAIWAN SEMICONDUCTOR MFG CO LTD

Pattern fidelity enhancement with directional patterning technology

Methods of reducing pattern roughness in semiconductor fabrication

Extreme ultraviolet photoresist

Extreme ultraviolet photoresist with high-efficiency electron transfer

Lithography process and material for negative tone development

Extreme ultraviolet photoresist with high-efficiency electron transfer

Photosensitive material and method of lithography

Patterning process of a semiconductor structure with a middle layer

Material composition and process for substrate modification

Photoresist having sensitizer bonded to acid generator

Photoresist additive for outgassing reduction and out-of-band radiation absorption

Materials and methods for forming resist bottom layer

Photolithography process and materials

Lithographic resist with floating protectant

Patterning process of a semiconductor structure with a middle layer

Lithography process and material for negative tone development

Photosensitive material and method of lithography

Extreme ultraviolet photoresist with high-efficiency electron transfer

Pattern formation method and material for manufacturing semiconductor devices

Pattern fidelity enhancement with directional patterning technology

Extreme ultraviolet photoresist and method

Materials and methods for forming resist bottom layer

Methods of reducing pattern roughness in semiconductor fabrication

Material composition and process for substrate modification

Extreme ultraviolet photoresist and method

Method and apparatus of patterning a semiconductor device

Extreme ultraviolet photoresist and method

Method for forming semiconductor structure using modified resist layer

WANG CHIEN-WEI

Patterning process and chemical amplified photoresist with a photodegradable base

Patterning process and photoresist with a photodegradable base

Patterning process and chemical amplified photoresist composition

Photoresist stripping technique

System and method of vapor deposition

Patterning process and materials for lithography

Method and apparatus of patterning a semiconductor device

Photoresist and patterning process

Photoresist and patterning process

Wet soluble lithography

Method for manufacturing a semiconductor device using a modified photosensitive layer

TAIWAN SEMICONDUCTOR MFG

Photoresist stripping technique

Manufacturing management system and method

Patterning process and chemical amplified photoresist composition

Double patterning strategy for contact hole and trench in photolithography

VANGUARD INT SEMICONDUCT CORP

Trigger circuit and operating circuit

Level shifter

Driving circuit

EXPERIAN INFORMATION SOLUTIONS

Systems and methods for analyzing data

EXPERIAN INF SOLUTIONS INC

Systems and methods for analyzing data

CHEN CHUN-KUANG

Double patterning strategy for contact hole and trench in photolithography

CORETRONIC CORP

Projector and correction method thereof for correcting geometric distortion of projection image