Inventor

CHI KYEONG-KOO

KR52 patents

⚠️ This page may combine multiple inventors who share the name “CHI KYEONG-KOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHI KYEONG-KOO

SAMSUNG ELECTRONICS CO LTD

Method of manufacturing a contact of a semiconductor device using cluster apparatus having at least one plasma pretreatment module

Methods of fabricating a semiconductor device

Semiconductor device including a metal gate electrode formed in a trench and method of forming thereof

Method of fabricating semiconductor device having capacitor

Wafer stage including electrostatic chuck and method for dechucking wafer using the wafer stage

Method for removing residual metal-containing polymer material and ion implanted photoresist in atmospheric downstream plasma jet system

Method and apparatus for selective spectroscopic analysis of a wafer surface and gas phase elements in a reaction chamber

Radio frequency generating systems and methods for forming pulse plasma using gradually pulsed time-modulated radio frequency power

Methods of fabricating cylinder-type capacitors for semiconductor devices using a hard mask and a mold layer

Method of manufacturing a semiconductor memory device

Method of fabricating flash memory device including control gate extensions

Semiconductor device with trench gate type transistor and method of manufacturing the same

Method of manufacturing a semiconductor device having contact pads

Methods of forming field effect transistors having recessed channel regions

Plasma diffusion control apparatus

Method of fabricating a flash memory device

Method of fabricating semiconductor device having capacitor

Semiconductor device including bit line formed using damascene technique and method of fabricating the same

Method for forming wire line by damascene process using hard mask formed from contacts

Methods for patterning microelectronic structures using chlorine, oxygen, and fluorine

Methods for forming alumina masking

Method of fabricating a semiconductor device

Methods of fabricating nonvolatile memory devices

Methods of fabricating flash memory devices and flash memory devices fabricated thereby

Nonvolatile memory devices

Method of forming capacitor for semiconductor device

Method of manufacturing self-aligned contact hole

Method of forming fine pattern of semiconductor device using sige layer as sacrificial layer, and method of forming self-aligned contacts using the same

Method of forming fine pattern of semiconductor device using SiGe layer as sacrificial layer, and method of forming self-aligned contacts using the same

Wafer stage including electrostatic chuck and method for dechucking wafer using the wafer stage

DRAM cell

DRAM cell

Methods of forming electrically conductive lines using nitrogen and chlorine containing gas mixtures

Method of optimizing seasoning recipe for etch process

Methods for patterning microelectronic structures using chlorine and oxygen

Semiconductor device with trench gate type transistor and method of manufacturing the same

Methods of forming field effect transistors having t-shaped gate electrodes using carbon-based etching masks

Methods of forming capacitor electrodes using fluorine and oxygen

Semiconductor device having self-aligned contact plug and method for fabricating the same

Plasma diffusion control apparatus

Device for measuring feeble light and method thereof

Method of fabricating semiconductor device having capacitor

Method for etching an object using a plasma and an object etched by a plasma

CHI KYEONG-KOO

Line width roughness control with arc layer open

Profile control in dielectric etch

CD bias loading control with ARC layer open

LAM RES CORP

Pulsed ultra-high aspect ratio dielectric etch

Ultra-high aspect ratio dielectric etch

CHO SUNG-IL

Methods of fabricating integrated circuit capacitors having u-shaped lower capacitor electrodes

SAMSUNG ELECTRONICS COL LTD

Semiconductor device having self-aligned contact plug and method for fabricating the same