Inventor

CHUNG SEUNG-PIL

KR31 patents

⚠️ This page may combine multiple inventors who share the name “CHUNG SEUNG-PIL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHUNG SEUNG-PIL

SAMSUNG ELECTRONICS CO LTD

Method of manufacturing a contact of a semiconductor device using cluster apparatus having at least one plasma pretreatment module

Method of removing oxide layer and semiconductor manufacturing apparatus for removing oxide layer

Method of removing contaminants from integrated circuit substrates using cleaning solutions

Vertical memory devices and methods of manufacturing the same

Methods of fabricating a semiconductor device

Wafer stage including electrostatic chuck and method for dechucking wafer using the wafer stage

Method for removing residual metal-containing polymer material and ion implanted photoresist in atmospheric downstream plasma jet system

Semiconductor chips and methods of manufacturing the same

Method of manufacturing a semiconductor memory device

Method of fabricating flash memory device including control gate extensions

Method of manufacturing a semiconductor capacitor having a hemispherical grain layer using a dry cleaning process

Method of manufacturing nonvolatile semiconductor memory device

Method of manufacturing a semiconductor device having contact pads

Vertical memory device

Method of fabricating a flash memory device

Semiconductor device including bit line formed using damascene technique and method of fabricating the same

Non-volatile memory device and method of manufacturing the same

Vertical memory device

Methods of fabricating nonvolatile memory devices

Nonvolatile memory devices

Methods of forming integrated circuit devices including a multi-layer structure with a contact extending therethrough

Wafer stage including electrostatic chuck and method for dechucking wafer using the wafer stage

Method of manufacturing a carbon nano-tube transistor

Phase change memory cell and method and system for forming the same

Semiconductor devices

Semiconductor device having fine pattern wiring lines integrally formed with contact plug and method of manufacturing same

YANG SONG-YI

Semiconductor device and method of double photolithography process for forming patterns of the semiconductor device

CHOI YONG-LACK

Method of fabricating semiconductor device

SAMSUNG ELECTROIC CO LTD

Method of patterning a matrix into a substrate via multiple, line-and-space, sacrificial, hard mask layers

AHN SUNG-SOO

Semiconductor devices and methods of manufacturing the semiconductor devices

CHO HONG

Integrated circuit devices including a multi-layer structure with a contact extending therethrough