Inventor

KANG CHANG-JIN

KR40 patents

⚠️ This page may combine multiple inventors who share the name “KANG CHANG-JIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KANG CHANG-JIN

SAMSUNG ELECTRONICS CO LTD

Method of forming fine patterns using double patterning process

Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same

Semiconductor device including a metal gate electrode formed in a trench and method of forming thereof

Method of fabricating semiconductor device having capacitor

Methods of fabricating cylinder-type capacitors for semiconductor devices using a hard mask and a mold layer

Method for forming a self aligned contact in a semiconductor device

Methods of etching platinum group metal film and forming lower electrode of capacitor

Non-volatile memory devices and methods of manufacturing the same

Method of manufacturing a semiconductor memory device

Method of fabricating flash memory device including control gate extensions

Semiconductor device with trench gate type transistor and method of manufacturing the same

Method of fabricating a flash memory device

Method of fabricating semiconductor device having capacitor

Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gas

Semiconductor device including bit line formed using damascene technique and method of fabricating the same

Method for fabricating a semiconductor device

Methods for fabricating semiconductor devices having capacitors

Method for forming wire line by damascene process using hard mask formed from contacts

Methods of forming capacitor structures including L-shaped cavities

Method of forming fine contact hole and method of fabricating semiconductor device using block copolymers

Method of fabricating a semiconductor device

Methods of fabricating flash memory devices and flash memory devices fabricated thereby

Method of forming capacitor for semiconductor device

Method of forming fine pattern of semiconductor device using sige layer as sacrificial layer, and method of forming self-aligned contacts using the same

Method of forming fine pattern of semiconductor device using SiGe layer as sacrificial layer, and method of forming self-aligned contacts using the same

Method of optimizing seasoning recipe for etch process

Method of forming tungsten pattern for a semiconductor device

Semiconductor device with trench gate type transistor and method of manufacturing the same

Methods of forming field effect transistors having t-shaped gate electrodes using carbon-based etching masks

Semiconductor device having self-aligned contact plug and method for fabricating the same

Method of fabricating semiconductor device having capacitor

Method for etching an object using a plasma and an object etched by a plasma

Method of forming a semiconductor device

Method of dry-etching semiconductor devices

Semiconductor memory device and method of manufacturing for preventing bit line oxidation

KIM DONG-HYUN

Non-volatile memory devices including first and second blocking layer patterns

SAMSUNG ELECTROIC CO LTD

Method of patterning a matrix into a substrate via multiple, line-and-space, sacrificial, hard mask layers

CHO SUNG-IL

Methods of fabricating integrated circuit capacitors having u-shaped lower capacitor electrodes

SAMSUNG ELECTRONICS COL LTD

Semiconductor device having self-aligned contact plug and method for fabricating the same

KANG CHANG-JIN

Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same