Inventor
KAMIMURA OSAMU
JP19 patents
⚠️ This page may combine multiple inventors who share the name “KAMIMURA OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
6 patentsUS5373112ADec 13, 1994
Multilayered wiring board having printed inductor
HITACHI LTD68 citations96
US6031494AFeb 29, 2000
Handy-phone with shielded high and low frequency circuits and planar antenna
HITACHI LTD37 citations91
US7041988B2May 9, 2006
Electron beam exposure apparatus and electron beam processing apparatus
HITACHI LTD8 citations73
US8022365B2Sep 20, 2011
Charged particle beam equipments, and charged particle beam microscope
HITACHI LTD1 citations52
US11985792B2May 14, 2024
Electronic computing apparatus and enclosure therefor
HITACHI LTD0 citations51
US12287025B2Apr 29, 2025
Booster lever unit
HITACHI LTD0 citations50
HITACHI HIGH TECH CORP
5 patentsUS7005659B2Feb 28, 2006
Charged particle beam exposure apparatus, charged particle beam exposure method, and device manufacturing method using the same apparatus
HITACHI HIGH TECH CORP8 citations74
US7173262B2Feb 6, 2007
Charged particle beam exposure apparatus, charged particle beam exposure method and device manufacturing method
HITACHI HIGH TECH CORP8 citations73
US6809319B2Oct 26, 2004
Electron beam writing equipment and electron beam writing method
HITACHI HIGH TECH CORP8 citations73
US7385194B2Jun 10, 2008
Charged particle beam application system
HITACHI HIGH TECH CORP6 citations69
US6838682B2Jan 4, 2005
Electron beam exposure equipment and electron beam exposure method
HITACHI HIGH TECH CORP4 citations62
CANON KK
4 patentsUS6969862B2Nov 29, 2005
Charged-particle-beam exposure apparatus and method of controlling same
CANON KK19 citations92
US7105842B2Sep 12, 2006
Method of charged particle beam lithography and equipment for charged particle beam lithography
CANON KK10 citations73
US7098464B2Aug 29, 2006
Electron beam writing equipment and electron beam writing method
CANON KK5 citations63
US7049607B2May 23, 2006
Electron beam writing equipment and electron beam writing method
CANON KK2 citations62