Inventor

SOHDA YASUNARI

JP76 patents

⚠️ This page may combine multiple inventors who share the name “SOHDA YASUNARI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SOHDA YASUNARI

HITACHI HIGH TECH CORP

Method and apparatus for applying charged particle beam

Standard component for calibration and electron-beam system using the same

Measurement method of electron beam current, electron beam writing system and electron beam detector

Charged particle beam apparatus and pattern measuring method

Electron beam measurement apparatus

Scanning electron microscope

Electron beam equipment

Electron beam writing system and electron beam writing method

Electron beam writing equipment and electron beam writing method

Scanning electron beam device with focus adjustment based on acceleration voltage and dimension measurement method using same

Pattern critical dimension measurement equipment and method for measuring pattern critical dimension

Scanning electron microscope

Charged particle beam application system

Calibration method for electron-beam system and electron-beam system

Electron gun and electron beam application device

System and method for measuring patterns

Scanning electron microscope

Scanning electron microscope and calibration of image distortion

Metrology system of fine pattern for process control by charged particle beam

Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same

Electron beam exposure equipment and electron beam exposure method

Calibration sample, electron beam adjustment method and electron beam apparatus using same

Aberration correction method, aberration correction system, and charged particle beam apparatus

HITACHI LTD

Charged particle beam lithography apparatus for forming pattern on semi-conductor

Electron beam writing system used in a cell projection method

Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same

Electron beam lithography apparatus and pattern forming method

Electron beam writing system

Electron beam lithography apparatus having electron optics correction system

Pattern forming method and pattern forming system

Electron beam lithography system

Electron beam monitoring sensor and electron beam monitoring method

Charged particle beam lithography apparatus for forming pattern on semi-conductor

Charged particle beam lithography apparatus for forming pattern on semi-conductor

Charged particle beam lithography apparatus for forming pattern on semi-conductor

Charged particle beam lithography method and apparatus thereof

Method and apparatus for electron beam lithography

Electron beam writing system

Electron beam exposure apparatus and electron beam processing apparatus

Electron beam writing method and apparatus for carrying out the same

Charged particle beam lithography apparatus for forming pattern on semi-conductor

CANON KK

Method of charged particle beam lithography and equipment for charged particle beam lithography

Electron beam writing equipment and electron beam writing method

Electron beam writing equipment and electron beam writing method

ADVANTEST CORP

Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus

FUKUDA MUNEYUKI

Charged particle beam device

SOHDA YASUNARI

Scanning electron microscope

NAKAYAMA YOSHINORI

Standard member for correction, scanning electron microscope using same, and scanning electron microscope correction method

OGINO MASAHIKO

Pattern forming method and its mold

OKAI NOBUHIRO

Method and apparatus for inspecting reticle