Inventor
Stachowiak Timothy Brian
US21 patents
Patents
21 patentsUS10883006B2Jan 5, 2021
Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
CANON KK5 citations73
US10845700B2Nov 24, 2020
Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
CANON KK5 citations73
US10668677B2Jun 2, 2020
Substrate pretreatment for reducing fill time in nanoimprint lithography
CANON KK2 citations73
US10134588B2Nov 20, 2018
Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
CANON KK4 citations73
US10935884B2Mar 2, 2021
Pattern forming method and methods for manufacturing processed substrate, optical component and quartz mold replica as well as coating material for imprint pretreatment and set thereof with imprint resist
CANON KK6 citations72
US10754244B2Aug 25, 2020
Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
CANON KK6 citations72
US10754245B2Aug 25, 2020
Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
CANON KK5 citations72
US10509313B2Dec 17, 2019
Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography
CANON KK3 citations72
US10481491B2Nov 19, 2019
Fluid droplet methodology and apparatus for imprint lithography
CANON KK3 citations72
US10095106B2Oct 9, 2018
Removing substrate pretreatment compositions in nanoimprint lithography
CANON KK6 citations72
US12428508B2Sep 30, 2025
Photocurable composition including a non-reactive polymer
CANON KK0 citations62
US11981759B2May 14, 2024
Photocurable composition
CANON KK0 citations62
US11752519B2Sep 12, 2023
Planarization method and photocurable composition
CANON KK0 citations62
US11434312B2Sep 6, 2022
Photocurable composition for forming cured layers with high thermal stability
CANON KK0 citations62
US11434313B2Sep 6, 2022
Curable composition for making cured layer with high thermal stability
CANON KK0 citations62
US10189188B2Jan 29, 2019
Nanoimprint lithography adhesion layer
CANON KK1 citations62
US12105417B2Oct 1, 2024
Method of forming a photo-cured layer
CANON KK0 citations58
US11249397B2Feb 15, 2022
Method of forming a cured layer by controlling drop spreading
CANON KK0 citations52
US12247133B2Mar 11, 2025
Photocurable composition including a reactive polymer
CANON KK0 citations51
US10620539B2Apr 14, 2020
Curing substrate pretreatment compositions in nanoimprint lithography
CANON KK0 citations41
US10317793B2Jun 11, 2019
Substrate pretreatment compositions for nanoimprint lithography
CANON KK0 citations41