Inventor
YANG TSUNG-HSUEH
TW22 patents
⚠️ This page may combine multiple inventors who share the name “YANG TSUNG-HSUEH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
21 patentsUS9536969B2Jan 3, 2017
Self-aligned split gate flash memory
TAIWAN SEMICONDUCTOR MFG CO LTD22 citations94
US10276779B2Apr 30, 2019
Top electrode cap structure for embedded memory
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US9711508B2Jul 18, 2017
Capacitor structure and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US9391151B2Jul 12, 2016
Split gate memory device for improved erase speed
TAIWAN SEMICONDUCTOR MFG CO LTD11 citations84
US11818962B2Nov 14, 2023
Sidewall spacer structure for memory cell
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11121308B2Sep 14, 2021
Sidewall spacer structure for memory cell
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10164181B2Dec 25, 2018
Sidewall protection of memory cell
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US12310261B2May 20, 2025
Memory device having via landing protection
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12274182B2Apr 8, 2025
Sidewall spacer structure for memory cell
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12207562B2Jan 21, 2025
Semiconductor devices and methods of manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11672180B2Jun 6, 2023
Semiconductor devices and methods of manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11289651B2Mar 29, 2022
Memory device having via landing protection
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12302764B2May 13, 2025
In-situ formation of a spacer layer for protecting sidewalls of a phase change memory element and methods for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10872895B2Dec 22, 2020
Method of manufacturing capacitor structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10727399B2Jul 28, 2020
Top electrode cap structure for embedded memory
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10505103B2Dec 10, 2019
Top electrode cap structure for embedded memory
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10276584B2Apr 30, 2019
Method to control the common drain of a pair of control gates and to improve inter-layer dielectric (ILD) filling between the control gates
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9799665B2Oct 24, 2017
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9673204B2Jun 6, 2017
Semiconductor device structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9570457B2Feb 14, 2017
Method to control the common drain of a pair of control gates and to improve inter-layer dielectric (ILD) filling between the control gates
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12369503B2Jul 22, 2025
Encapsulated phase change material switch and methods for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51