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Inventor

DONG LIN

CN36 patents
⚠️ This page may combine multiple inventors who share the name “DONG LIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

17 patents
US10177227B1Jan 8, 2019

Method for fabricating junctions and spacers for horizontal gate all around devices

APPLIED MATERIALS INC40 citations92
US9673277B2Jun 6, 2017

Methods and apparatus for forming horizontal gate all around device structures

APPLIED MATERIALS INC13 citations83
US10608097B2Mar 31, 2020

Low thickness dependent work-function nMOS integration for metal gate

APPLIED MATERIALS INC2 citations73
US9748354B2Aug 29, 2017

Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof

APPLIED MATERIALS INC5 citations73
US11658218B2May 23, 2023

P-type dipole for p-FET

APPLIED MATERIALS INC2 citations72
US11289579B2Mar 29, 2022

P-type dipole for p-FET

APPLIED MATERIALS INC4 citations72
US11245022B2Feb 8, 2022

Integrated dipole flow for transistor

APPLIED MATERIALS INC2 citations72
US11996455B2May 28, 2024

P-type dipole for P-FET

APPLIED MATERIALS INC0 citations62
US11062900B2Jul 13, 2021

Method of reducing effective oxide thickness in a semiconductor structure

APPLIED MATERIALS INC1 citations62
US11888045B2Jan 30, 2024

Integrated dipole flow for transistor

APPLIED MATERIALS INC0 citations61
US11776806B2Oct 3, 2023

Multi-step pre-clean for selective metal gap fill

APPLIED MATERIALS INC0 citations61
US11380536B2Jul 5, 2022

Multi-step pre-clean for selective metal gap fill

APPLIED MATERIALS INC1 citations61
US11075276B2Jul 27, 2021

Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors

APPLIED MATERIALS INC1 citations60
US10170321B2Jan 1, 2019

Aluminum content control of TiAIN films

APPLIED MATERIALS INC1 citations60
US10665450B2May 26, 2020

Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films

APPLIED MATERIALS INC0 citations52
US12249511B2Mar 11, 2025

Treatments to improve device performance

APPLIED MATERIALS INC0 citations51
US10262858B2Apr 16, 2019

Surface functionalization and passivation with a control layer

APPLIED MATERIALS INC0 citations48

IBM

5 patents

DONG LIN

4 patents

SAP SE

2 patents

UNIV SICHUAN

2 patents

UNIV PIERRE ET MARIE CURIE PARIS 6

1 patent

ERICSSON TELEFON AB L M

1 patent

DARTMOUTH COLLEGE

1 patent

TONGZHOU LANHAI BEIJING HOLDING CO LTD

1 patent

UNIV CHINA PETROLEUM EAST CHINA

1 patent

KISELKARBID I STOCKHOLM AB

1 patent