Inventor
IKEBE Yohei
JP28 patents
Patents
28 patentsUS11531264B2Dec 20, 2022
Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method
HOYA CORP4 citations84
US10481484B2Nov 19, 2019
Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing semiconductor device
HOYA CORP12 citations84
US10394113B2Aug 27, 2019
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP7 citations84
US9864267B2Jan 9, 2018
Reflective mask blank, reflective mask, and method for manufacturing semiconductor device
HOYA CORP8 citations84
US10871707B2Dec 22, 2020
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP7 citations83
US12111566B2Oct 8, 2024
Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method
HOYA CORP2 citations73
US12105413B2Oct 1, 2024
Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
HOYA CORP2 citations73
US11815807B2Nov 14, 2023
Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
HOYA CORP2 citations73
US11550215B2Jan 10, 2023
Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
HOYA CORP3 citations73
US11187972B2Nov 30, 2021
Reflective mask blank, method of manufacturing reflective mask and method of manufacturing semiconductor device
HOYA CORP3 citations73
US10921705B2Feb 16, 2021
Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP2 citations73
US11480867B2Oct 25, 2022
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP4 citations72
US11003068B2May 11, 2021
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP2 citations72
US12411402B2Sep 9, 2025
Reflective mask blank, reflective mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US12228852B2Feb 18, 2025
Reflective mask blank, reflective mask and method for manufacturing a semiconductor device
HOYA CORP0 citations62
US12135496B2Nov 5, 2024
Reflective mask blank and reflective mask
HOYA CORP0 citations62
US11914281B2Feb 27, 2024
Reflective mask blank, reflective mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US11880130B2Jan 23, 2024
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11815806B2Nov 14, 2023
Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method
HOYA CORP0 citations62
US11281090B2Mar 22, 2022
Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11249385B2Feb 15, 2022
Reflective mask blank, reflective mask, method of manufacturing same, and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11131921B2Sep 28, 2021
Method for manufacturing reflective mask blank, and method for manufacturing reflective mask
HOYA CORP0 citations62
US11237472B2Feb 1, 2022
Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method
HOYA CORP0 citations58
US10642149B2May 5, 2020
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations52
US10067419B2Sep 4, 2018
Method for manufacturing reflective mask blank, and method for manufacturing reflective mask
HOYA CORP1 citations52
US11892768B2Feb 6, 2024
Reflective mask blank, reflective mask and method of manufacturing the same, and method of manufacturing semiconductor device
HOYA CORP0 citations43
US12517422B2Jan 6, 2026
Reflective mask blank, reflective mask, and method of manufacturing semiconductor device
HOYA CORP0 citations41
US10578961B2Mar 3, 2020
Mask blank substrate, multi-layer reflective film coated substrate, and mask blank
HOYA CORP0 citations41