Inventor

MENG CHING LING

US32 patents

⚠️ This page may combine multiple inventors who share the name “MENG CHING LING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MENG CHING LING

TOKYO ELECTRON LTD

Dark field wafer nano-defect inspection system with a singular beam

Optical metrology system optimized with a plurality of design goals

Optical metrology system optimized with design goals

Automated process control using an optical metrology system optimized with design goals

Designing an optical metrology system optimized with signal criteria

Apparatus for designing an optical metrology system optimized with signal criteria

Process control using an optical metrology system optimized with signal criteria

Normal-incident in-situ process monitor sensor

Spatially resolved optical emission spectroscopy (OES) in plasma processing

Spatially resolved optical emission spectroscopy (OES) in plasma processing

Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber

System for in-situ film stack measurement during etching and etch control method

Differential acoustic time of flight measurement of temperature of semiconductor substrates

Normal-incidence in-situ process monitor sensor

Normal-incidence in-situ process monitor sensor

Apparatus and method for monitoring and measuring properties of polymers in solutions

Method and system for lamp temperature control in optical metrology

Optical sensor for phase determination

Optical sensors for measuring properties of consumable parts in a semiconductor plasma processing chamber

KLA TENCOR TECH CORP

Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool

Systems and methods for characterizing a polishing process

Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool

Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device

Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool

Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing

Gas purge system and methods

Methods and systems for detecting a presence of blobs on a specimen during a polishing process

KLA TENCOR TECHNOLOGIES

Windows configurable to be coupled to a process tool or to be disposed within an opening in a polishing pad

(unassigned)

Polishing media magazine for improved polishing

INTEL CORP

Optical device latching mechanism

APPLIED MATERIALS INC

Chemical mechanical planarization system

LEHMAN KURT

Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool