Inventor
TIAN XINKANG
US29 patents
⚠️ This page may combine multiple inventors who share the name “TIAN XINKANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
24 patentsUS10345246B2Jul 9, 2019
Dark field wafer nano-defect inspection system with a singular beam
TOKYO ELECTRON LTD20 citations94
US7595869B1Sep 29, 2009
Optical metrology system optimized with a plurality of design goals
TOKYO ELECTRON LTD24 citations92
US10910201B1Feb 2, 2021
Synthetic wavelengths for endpoint detection in plasma etching
TOKYO ELECTRON LTD7 citations84
US7761250B2Jul 20, 2010
Optical metrology system optimized with design goals
TOKYO ELECTRON LTD12 citations84
US7761178B2Jul 20, 2010
Automated process control using an optical metrology system optimized with design goals
TOKYO ELECTRON LTD16 citations84
US7660696B1Feb 9, 2010
Apparatus for auto focusing a workpiece using two or more focus parameters
TOKYO ELECTRON LTD15 citations84
US7742889B2Jun 22, 2010
Designing an optical metrology system optimized with signal criteria
TOKYO ELECTRON LTD9 citations82
US7734437B2Jun 8, 2010
Apparatus for designing an optical metrology system optimized with signal criteria
TOKYO ELECTRON LTD12 citations82
US7589845B1Sep 15, 2009
Process control using an optical metrology system optimized with signal criteria
TOKYO ELECTRON LTD16 citations82
US11538723B2Dec 27, 2022
Optical diagnostics of semiconductor process using hyperspectral imaging
TOKYO ELECTRON LTD3 citations73
US10978278B2Apr 13, 2021
Normal-incident in-situ process monitor sensor
TOKYO ELECTRON LTD2 citations73
US10453653B2Oct 22, 2019
Endpoint detection algorithm for atomic layer etching (ALE)
TOKYO ELECTRON LTD3 citations72
US10692705B2Jun 23, 2020
Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber
TOKYO ELECTRON LTD5 citations71
US9059038B2Jun 16, 2015
System for in-situ film stack measurement during etching and etch control method
TOKYO ELECTRON LTD5 citations71
US12261030B2Mar 25, 2025
Normal-incidence in-situ process monitor sensor
TOKYO ELECTRON LTD0 citations62
US12165937B2Dec 10, 2024
Optical diagnostics of semiconductor process using hyperspectral imaging
TOKYO ELECTRON LTD0 citations62
US11961721B2Apr 16, 2024
Normal-incidence in-situ process monitor sensor
TOKYO ELECTRON LTD0 citations62
US11538722B2Dec 27, 2022
Optical diagnostics of semiconductor process using hyperspectral imaging
TOKYO ELECTRON LTD0 citations62
US8030631B2Oct 4, 2011
Apparatus for controlling angle of incidence of multiple illumination beams
TOKYO ELECTRON LTD5 citations62
US10837902B2Nov 17, 2020
Optical sensor for phase determination
TOKYO ELECTRON LTD1 citations59
US11763161B2Sep 19, 2023
Enhanced resolution in semiconductor fabrication data acquisition instruments using machine learning
TOKYO ELECTRON LTD0 citations52
US11692874B2Jul 4, 2023
Peak alignment for the wavelength calibration of a spectrometer
TOKYO ELECTRON LTD0 citations52
US12588467B2Mar 24, 2026
Optical sensors for measuring properties of consumable parts in a semiconductor plasma processing chamber
TOKYO ELECTRON LTD0 citations49
US7948630B2May 24, 2011
Auto focus of a workpiece using two or more focus parameters
TOKYO ELECTRON LTD0 citations31