Inventor
SCHLOTT MARTIN
DE14 patents
⚠️ This page may combine multiple inventors who share the name “SCHLOTT MARTIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LEYBOLD MATERIALS GMBH
6 patentsUS5480532AJan 2, 1996
Sputter target for cathodic atomization to produce transparent, conductive layers
LEYBOLD MATERIALS GMBH21 citations89
US5531948AJul 2, 1996
Process for the production of partially reduced indium oxide-tin oxide targets
LEYBOLD MATERIALS GMBH9 citations71
US5660599AAug 26, 1997
Process for the recycling of spent indium oxide-tin oxide sputtering targets
LEYBOLD MATERIALS GMBH9 citations70
US6187253B1Feb 13, 2001
Method of preparing indium oxide/tin oxide target for cathodic sputtering
LEYBOLD MATERIALS GMBH7 citations69
US6372104B1Apr 16, 2002
Cobalt base alloy sputtering target with high magnetic field penetration
LEYBOLD MATERIALS GMBH11 citations68
US5728279AMar 17, 1998
Cobalt base alloy target for a magnetron cathode sputtering system
LEYBOLD MATERIALS GMBH14 citations68
MATERION ADVANCED MAT GERMANY GMBH
3 patentsUS11566320B2Jan 31, 2023
NiW(X) sputtering target with improved structure
MATERION ADVANCED MAT GERMANY GMBH0 citations58
US11125708B2Sep 21, 2021
Silver alloy-based sputter target
MATERION ADVANCED MAT GERMANY GMBH0 citations58
US9960022B2May 1, 2018
Sputtering target with optimized performance characteristics
MATERION ADVANCED MAT GERMANY GMBH0 citations44