Inventor

KONIETZKA UWE

US6 patents

⚠️ This page may combine multiple inventors who share the name “KONIETZKA UWE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEYBOLD MATERIALS GMBH

1 patent

US5480532AJan 2, 1996

Sputter target for cathodic atomization to produce transparent, conductive layers

LEYBOLD MATERIALS GMBH21 citations89

HERAEUS GMBH W C

1 patent

US6581669B2Jun 24, 2003

Sputtering target for depositing silicon layers in their nitride or oxide form and a process for its preparation

HERAEUS GMBH W C11 citations72

DEGUSSA

1 patent

US5480531AJan 2, 1996

Target for cathode sputtering and method of its production

DEGUSSA13 citations71

LEYBOLD AG

1 patent

US5407548AApr 18, 1995

Method for coating a substrate of low resistance to corrosion

LEYBOLD AG14 citations71

MATERION ADVANCED MAT GERMANY GMBH

1 patent

US11125708B2Sep 21, 2021

Silver alloy-based sputter target

MATERION ADVANCED MAT GERMANY GMBH0 citations58

HERAEUS MATERIALS TECH GMBH

1 patent

US8974707B2Mar 10, 2015

Planar or tubular sputtering target and method for the production thereof

HERAEUS MATERIALS TECH GMBH0 citations42