Inventor
OOTERA HIROKI
JP13 patents
Patents
13 patentsUS6244211B1Jun 12, 2001
Plasma processing apparatus
MITSUBISHI ELECTRIC CORP193 citations98
US6076483AJun 20, 2000
Plasma processing apparatus using a partition panel
MITSUBISHI ELECTRIC CORP82 citations96
US5733405AMar 31, 1998
Plasma processing apparatus
MITSUBISHI ELECTRIC CORP86 citations95
US5115167AMay 19, 1992
Plasma processor
MITSUBISHI ELECTRIC CORP55 citations95
US4894510AJan 16, 1990
Apparatus for uniformly distributing plasma over a substrate
MITSUBISHI ELECTRIC CORP58 citations95
US6417111B2Jul 9, 2002
Plasma processing apparatus
MITSUBISHI ELECTRIC CORP30 citations92
US6167835B1Jan 2, 2001
Two chamber plasma processing apparatus
MITSUBISHI ELECTRIC CORP43 citations92
US6020570AFeb 1, 2000
Plasma processing apparatus
MITSUBISHI ELECTRIC CORP23 citations92
US4947085AAug 7, 1990
Plasma processor
MITSUBISHI ELECTRIC CORP48 citations92
US6787874B2Sep 7, 2004
Semiconductor device
MITSUBISHI ELECTRIC CORP8 citations73
US5146138ASep 8, 1992
Plasma processor
MITSUBISHI ELECTRIC CORP7 citations73
US6335595B1Jan 1, 2002
Plasma generating apparatus
MITSUBISHI ELECTRIC CORP10 citations72
US6756312B2Jun 29, 2004
Method of fabricating a semiconductor device including time-selective etching process
MITSUBISHI ELECTRIC CORP1 citations51