Inventor

LIN BENJAMIN SZU-MIN

TW49 patents

⚠️ This page may combine multiple inventors who share the name “LIN BENJAMIN SZU-MIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIN BENJAMIN SZU-MIN

UNITED MICROELECTRONICS CORP

Phase-shifting mask for photolithography in semiconductor fabrications

Phase-shifting mask structure and method of fabricating the same

Method for forming dual damascene structure

Method for removing native oxide

Method of forming an opening in a dielectric layer through a photoresist layer with silylated sidewall spacers

Photolithography technique utilizing alignment marks at scribe line intersections

Method of fabricating a dual damascene structure

Method for manufacturing DRAM capacitor

Method for shrinking critical dimension of semiconductor devices

Phase shifting lithographic process

Sandwich photoresist structure in photolithographic process

Multiphase phase shifting mask

Method of forming a phase shift mask

Method for manufacturing cylindrical lower electrode of DRAM capacitor

Method of forming landing pads for bit line and node contact

Method for fabricating a photomask

Double-alternating phase-shifting mask

Half tone phase shift mask comprising second pattern layer on backside of substrate

Double-sided photomask

Method for manufacturing dram capacitor

Method of forming a node contact hole on a semiconductor wafer

Phase shifting lithographic process

Method for forming different patterns using one mask

Bi-focus exposure process

Fabrication method for a vertical MOS transistor

Alignment and exposure process utilizing split beam for exposure and alignment

Structure of a phase shifting mask and method of fabricating the same

Method for fabricating a crown-shaped capacitor

Profile improvement method for patterning

Method of manufacturing a DRAM capacitor

Method of preventing toppling of lower electrode through flush cleaning

EUV reflection mask and lithographic process using the same

Structure of phase shifting mask

Installation for fabricating double-sided photomask

Method of forming a node contact of a DRAM&#39;s memory cell

Method for designing photomask

Method of fabricating self-aligned polysilicon via plug

Method and related operation system for immersion lithography

WINBOND ELECTRONICS CORP

Method for opening contacts of different depths in a semiconductor wafer

CD vernier apparatus for SEM CD measurement

Metal salicide-CMP-metal salicide semiconductor process

Two-step metal salicide semiconductor process

INFINEON TECHNOLOGIES AG

Transmission mask with differential attenuation to improve ISO-dense proximity

Effective assist pattern for nested and isolated contacts

UNITED MICROELECTRONICS CROP

Mask with alternating scattering bars

UNITED MICROELECTRONICS CO

Transmission mask with differential attenuation to improve ISO-dense proximity

(unassigned)

Method of forming a multi-layer photo mask

UNITED MICROELETRONICS CORP

Method for forming a photomask

LIU HANG YIP

Transmission mask with differential attenuation to improve ISO-dense proximity

Method of forming a node contact of a DRAM's memory cell