Inventor

MA SHAWMING

US48 patents

⚠️ This page may combine multiple inventors who share the name “MA SHAWMING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MA SHAWMING

MATTSON TECH INC

Atomic layer etch process using plasma in conjunction with a rapid thermal activation process

Variable mode plasma chamber utilizing tunable plasma potential

Atomic layer etch process using plasma in conjunction with a rapid thermal activation process

Variable mode plasma chamber utilizing tunable plasma potential

Atomic layer etch process using plasma in conjunction with a rapid thermal activation process

Enhanced ignition in inductively coupled plasmas for workpiece processing

Processing of semiconductors using vaporized solvents

Methods for tuning plasma potential using variable mode plasma chamber

Method for processing a workpiece

Method for processing a workpiece using a multi-cycle thermal treatment process

Plasma strip tool with uniformity control

Strip process for high aspect ratio structure

Plasma processing apparatus with post plasma gas injection

Focus ring adjustment assembly of a system for processing workpieces under vacuum

Plasma processing apparatus having a focus ring adjustment assembly

Carbon containing hardmask removal process using sulfur containing process gas

Method for processing a workpiece using a multi-cycle thermal treatment process

Air leak detection in plasma processing apparatus with separation grid

Arc lamp with forming gas for thermal processing systems

Methods for the treatment of workpieces

Strip process for high aspect ratio structure

Implanted photoresist stripping process

APPLIED MATERIALS INC

Conductive collar surrounding semiconductor workpiece in plasma chamber

Device for monitoring substrate charging and method of fabricating same

Method of reducing plasma charging damage during dielectric etch process for dual damascene interconnect structures

Process to open carbon based hardmask

Methods to avoid unstable plasma states during a process transition

Dielectric plasma etch process with in-situ amorphous carbon mask with improved critical dimension and etch selectivity

Etch process with controlled critical dimension shrink

AGILENT TECHNOLOGIES INC

Three-dimensional ferroelectric capacitor structure for nonvolatile random access memory cell

Method of fabricating a ferroelectric memory cell

Elevated image sensor array which includes isolation between uniquely shaped image sensors

Elevated pin diode active pixel sensor which includes a patterned doped semiconductor electrode

Conductive mesh bias connection for an array of elevated active pixel sensors

BEIJING E TOWN SEMICONDUCTOR TECH CO LTD

Variable mode plasma chamber utilizing tunable plasma potential

Enhanced ignition in inductively coupled plasmas for workpiece processing

Enhanced ignition in inductively coupled plasmas for workpiece processing

Arc lamp with forming gas for thermal processing systems

HEWLETT PACKARD CO

Elevated image sensor array which includes isolation between the image sensors and a unique interconnection

Monolithic ink jet nozzle formed from an oxide and nitride composition

Monolithic ink jet nozzle formed from an oxide and nitride composition

TEXAS INSTRUMENTS INC

Hydrogen-free contact etch for ferroelectric capacitor formation

Ferroelectric capacitor plasma charging monitor

Ferroelectric capacitor plasma charging monitor

HEWLETT PACKARD CMPANY

Elevated pin diode active pixel sensor including a unique interconnection structure

(unassigned)

Method of reducing plasma charging damage during dielectric etch process for dual damascene interconnect structures

WANG JUDY

Plasma etching carbonaceous layers with sulfur-based etchants

APPLIED MATERAILS INC

Method of real-time plasma charging voltage measurement on powered electrode with electrostatic chuck in plasma process chambers