Inventor
KWONG RANEE W
US26 patents
⚠️ This page may combine multiple inventors who share the name “KWONG RANEE W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
24 patentsUS5114826AMay 19, 1992
Photosensitive polyimide compositions
IBM98 citations96
US4692205ASep 8, 1987
Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings
IBM149 citations96
US6939664B2Sep 6, 2005
Low-activation energy silicon-containing resist system
IBM30 citations93
US6818381B2Nov 16, 2004
Underlayer compositions for multilayer lithographic processes
IBM21 citations92
US6653045B2Nov 25, 2003
Radiation sensitive silicon-containing negative resists and use thereof
IBM15 citations92
US6436605B1Aug 20, 2002
Plasma resistant composition and use thereof
IBM31 citations92
US6171757B1Jan 9, 2001
Organometallic polymers and use thereof
IBM26 citations92
US6245492B1Jun 12, 2001
Photoresist system and process for aerial image enhancement
IBM32 citations91
US5296332AMar 22, 1994
Crosslinkable aqueous developable photoresist compositions and method for use thereof
IBM49 citations90
US5240812AAug 31, 1993
Top coat for acid catalyzed resists
IBM35 citations90
US4978594ADec 18, 1990
Fluorine-containing base layer for multi-layer resist processes
IBM39 citations90
US6770419B2Aug 3, 2004
Low silicon-outgassing resist for bilayer lithography
IBM14 citations83
US4665006AMay 12, 1987
Positive resist system having high resistance to oxygen reactive ion etching
IBM21 citations82
US6821718B2Nov 23, 2004
Radiation sensitive silicon-containing negative resists and use thereof
IBM10 citations74
US6689540B2Feb 10, 2004
Polymers and use thereof
IBM7 citations74
US6458907B1Oct 1, 2002
Organometallic polymers and use thereof
IBM10 citations74
US6927015B2Aug 9, 2005
Underlayer compositions for multilayer lithographic processes
IBM10 citations73
US6140015AOct 31, 2000
Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching
IBM9 citations73
US9040225B2May 26, 2015
Developable bottom antireflective coating composition and pattern forming method using thereof
IBM2 citations63
US8373271B2Feb 12, 2013
Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabrication
IBM4 citations63
US6586156B2Jul 1, 2003
Etch improved resist systems containing acrylate (or methacrylate) silane monomers
IBM6 citations61
US5307357AApr 26, 1994
Protection means for ridge waveguide laser structures using thick organic films
IBM6 citations58
US6346362B1Feb 12, 2002
Polymers and use thereof
IBM0 citations52
US6265134B1Jul 24, 2001
Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching
IBM1 citations52