Inventor
LANG ROBERT N
US11 patents
⚠️ This page may combine multiple inventors who share the name “LANG ROBERT N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
10 patentsUS6420084B1Jul 16, 2002
Mask-making using resist having SIO bond-containing polymer
IBM83 citations97
US6653045B2Nov 25, 2003
Radiation sensitive silicon-containing negative resists and use thereof
IBM15 citations92
US5399462AMar 21, 1995
Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane
IBM33 citations92
US5240812AAug 31, 1993
Top coat for acid catalyzed resists
IBM35 citations90
US6821718B2Nov 23, 2004
Radiation sensitive silicon-containing negative resists and use thereof
IBM10 citations74
US6730445B2May 4, 2004
Attenuated embedded phase shift photomask blanks
IBM8 citations72
US6682860B2Jan 27, 2004
Attenuated embedded phase shift photomask blanks
IBM7 citations72
US6586156B2Jul 1, 2003
Etch improved resist systems containing acrylate (or methacrylate) silane monomers
IBM6 citations61
US7314700B2Jan 1, 2008
High sensitivity resist compositions for electron-based lithography
IBM1 citations51
US6979518B2Dec 27, 2005
Attenuated embedded phase shift photomask blanks
IBM0 citations51