Inventor
NAKASUJI MAMORU
JP134 patents
⚠️ This page may combine multiple inventors who share the name “NAKASUJI MAMORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
EBARA CORP
26 patentsUS7109483B2Sep 19, 2006
Method for inspecting substrate, substrate inspecting system and electron beam apparatus
EBARA CORP159 citations99
US6855929B2Feb 15, 2005
Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
EBARA CORP106 citations99
US6593152B2Jul 15, 2003
Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
EBARA CORP109 citations99
US9368314B2Jun 14, 2016
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP38 citations98
US7420164B2Sep 2, 2008
Objective lens, electron beam system and method of inspecting defect
EBARA CORP68 citations98
US7244932B2Jul 17, 2007
Electron beam apparatus and device fabrication method using the electron beam apparatus
EBARA CORP74 citations98
US7601972B2Oct 13, 2009
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP49 citations96
US7223973B2May 29, 2007
Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
EBARA CORP38 citations96
US7135676B2Nov 14, 2006
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP61 citations96
US7049585B2May 23, 2006
Sheet beam-type testing apparatus
EBARA CORP55 citations96
US8053726B2Nov 8, 2011
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP11 citations93
US7928378B2Apr 19, 2011
Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
EBARA CORP17 citations93
US7569838B2Aug 4, 2009
Electron beam inspection system and inspection method and method of manufacturing devices using the system
EBARA CORP23 citations93
US7417236B2Aug 26, 2008
Sheet beam-type testing apparatus
EBARA CORP20 citations93
US7411191B2Aug 12, 2008
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP20 citations93
US7408175B2Aug 5, 2008
Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
EBARA CORP19 citations93
US7385197B2Jun 10, 2008
Electron beam apparatus and a device manufacturing method using the same apparatus
EBARA CORP30 citations93
US7351969B2Apr 1, 2008
Electron beam inspection system and inspection method and method of manufacturing devices using the system
EBARA CORP37 citations93
US7312449B2Dec 25, 2007
Electron beam system and method of manufacturing devices using the system
EBARA CORP20 citations93
US7297949B2Nov 20, 2007
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP28 citations93
US7248353B2Jul 24, 2007
Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples
EBARA CORP19 citations93
US7157703B2Jan 2, 2007
Electron beam system
EBARA CORP29 citations93
US7129485B2Oct 31, 2006
Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
EBARA CORP30 citations93
US7109484B2Sep 19, 2006
Sheet beam-type inspection apparatus
EBARA CORP23 citations93
US7005641B2Feb 28, 2006
Electron beam apparatus and a device manufacturing method by using said electron beam apparatus
EBARA CORP35 citations93
US6853143B2Feb 8, 2005
Electron beam system and method of manufacturing devices using the system
EBARA CORP23 citations93
NIKON CORP
22 patentsUS5892224AApr 6, 1999
Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams
NIKON CORP285 citations99
US6465783B1Oct 15, 2002
High-throughput specimen-inspection apparatus and methods utilizing multiple parallel charged particle beams and an array of multiple secondary-electron-detectors
NIKON CORP87 citations98
US5981947ANov 9, 1999
Apparatus for detecting or collecting secondary electrons, charged-particle beam exposure apparatus comprising same, and related methods
NIKON CORP94 citations98
US7095022B2Aug 22, 2006
Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
NIKON CORP48 citations96
US6125522AOct 3, 2000
Manufacturing method for electrostatic deflector
NIKON CORP79 citations96
US6087667AJul 11, 2000
Charged-particle-beam (CPB) lithography apparatus, evaluation method, and CPB source
NIKON CORP78 citations96
US6087046AJul 11, 2000
Methods for forming microlithographic masks that compensate for proximity effects
NIKON CORP79 citations96
US5831270ANov 3, 1998
Magnetic deflectors and charged-particle-beam lithography systems incorporating same
NIKON CORP79 citations96
US5770863AJun 23, 1998
Charged particle beam projection apparatus
NIKON CORP62 citations96
US6487063B1Nov 26, 2002
Electrostatic wafer chuck, and charged-particle-beam microlithography apparatus and methods comprising same
NIKON CORP20 citations93
US6235450B1May 22, 2001
Pattern formation methods combining light lithography and electron-beam lithography and manufacturing methods using the same
NIKON CORP24 citations93
US6117600ASep 12, 2000
Charged-particle-beam transfer methods utilizing high and low resolution sub-patterns
NIKON CORP24 citations93
US6064071AMay 16, 2000
Charged-particle-beam optical systems
NIKON CORP30 citations93
US6059981AMay 9, 2000
Fiducial marks for charged-particle-beam exposure apparatus and methods for forming same
NIKON CORP27 citations93
US5994704ANov 30, 1999
Electromagnetic deflector
NIKON CORP30 citations93
US5986765ANov 16, 1999
Apparatus including compensation mask to correct particle beam proximity-effect
NIKON CORP21 citations93
US5973333AOct 26, 1999
Charged-particle-beam pattern-transfer apparatus and methods
NIKON CORP40 citations93
US5888682AMar 30, 1999
Method of using a compensation mask to correct particle beam proximity-effect
NIKON CORP29 citations93
US5763893AJun 9, 1998
Electron gun and electron-beam transfer apparatus comprising same
NIKON CORP39 citations93
US5751538AMay 12, 1998
Mask holding device and method for holding mask
NIKON CORP43 citations93
US5689117ANov 18, 1997
Apparatus for image transfer with charged particle beam, and deflector and mask used with such apparatus
NIKON CORP19 citations93
US5629526AMay 13, 1997
Electro-magnetic lens, charged particle beam transferring apparatus, and method for manufacturing electro-magnetic lens
NIKON CORP21 citations93
TOSHIBA KK
2 patentsShowing the top 50 of 134 patents by PatentIndex Score.