Inventor
KIM HUNG-EIL
US24 patents
⚠️ This page may combine multiple inventors who share the name “KIM HUNG-EIL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
17 patentsUS7065738B1Jun 20, 2006
Method of verifying an optical proximity correction (OPC) model
ADVANCED MICRO DEVICES INC63 citations98
US7207017B1Apr 17, 2007
Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results
ADVANCED MICRO DEVICES INC85 citations97
US6581023B1Jun 17, 2003
Accurate contact critical dimension measurement using variable threshold method
ADVANCED MICRO DEVICES INC58 citations96
US7194725B1Mar 20, 2007
System and method for design rule creation and selection
ADVANCED MICRO DEVICES INC57 citations95
US7313769B1Dec 25, 2007
Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin
ADVANCED MICRO DEVICES INC30 citations92
US7269804B2Sep 11, 2007
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
ADVANCED MICRO DEVICES INC27 citations92
US6544699B1Apr 8, 2003
Method to improve accuracy of model-based optical proximity correction
ADVANCED MICRO DEVICES INC34 citations92
US7422828B1Sep 9, 2008
Mask CD measurement monitor outside of the pellicle area
ADVANCED MICRO DEVICES INC14 citations84
US7368225B1May 6, 2008
Two mask photoresist exposure pattern for dense and isolated regions
ADVANCED MICRO DEVICES INC5 citations74
US6593039B1Jul 15, 2003
Photoresist mask that combines attenuated and alternating phase shifting masks
ADVANCED MICRO DEVICES INC9 citations74
US6900124B1May 31, 2005
Patterning for elliptical Vss contact on flash memory
ADVANCED MICRO DEVICES INC9 citations73
US6576376B1Jun 10, 2003
Tri-tone mask process for dense and isolated patterns
ADVANCED MICRO DEVICES INC2 citations63
US6566020B2May 20, 2003
Dark field trench in an alternating phase shift mask to avoid phase conflict
ADVANCED MICRO DEVICES INC4 citations63
US7543256B1Jun 2, 2009
System and method for designing an integrated circuit device
ADVANCED MICRO DEVICES INC6 citations62
US7384725B2Jun 10, 2008
System and method for fabricating contact holes
ADVANCED MICRO DEVICES INC3 citations62
US7018922B1Mar 28, 2006
Patterning for elongated VSS contact flash memory
ADVANCED MICRO DEVICES INC5 citations62
US6811932B1Nov 2, 2004
Method and system for determining flow rates for contact formation
ADVANCED MICRO DEVICES INC0 citations52
HYUNDAI ELECTRONICS IND
3 patentsUS5756235AMay 26, 1998
Phase shift mask and method for fabricating the same
HYUNDAI ELECTRONICS IND20 citations92
US5897975AApr 27, 1999
Phase shift mask for formation of contact holes having micro dimension
HYUNDAI ELECTRONICS IND15 citations72
US5817437AOct 6, 1998
Method for detecting phase error of a phase shift mask
HYUNDAI ELECTRONICS IND4 citations61
GLOBALFOUNDRIES INC
2 patentsUS7657864B2Feb 2, 2010
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
GLOBALFOUNDRIES INC5 citations74
US7788609B2Aug 31, 2010
Method and apparatus for optimizing an optical proximity correction model
GLOBALFOUNDRIES INC1 citations52