P

Inventor

CHOI SUN-YONG

KR20 patents
⚠️ This page may combine multiple inventors who share the name “CHOI SUN-YONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

16 patents
US5676824AOct 14, 1997

Water purifier with means for indicating when filter replacement is due and for automatically initiating a membrane washing step

SAMSUNG ELECTRONICS CO LTD48 citations89
US5755469AMay 26, 1998

Wafer transfer blade

SAMSUNG ELECTRONICS CO LTD15 citations69
US7113274B2Sep 26, 2006

Method and apparatus for inspecting a substrate

SAMSUNG ELECTRONICS CO LTD2 citations63
US7405817B2Jul 29, 2008

Method and apparatus for classifying defects of an object

SAMSUNG ELECTRONICS CO LTD2 citations62
US7310140B2Dec 18, 2007

Method and apparatus for inspecting a wafer surface

SAMSUNG ELECTRONICS CO LTD2 citations62
US7271890B2Sep 18, 2007

Method and apparatus for inspecting defects

SAMSUNG ELECTRONICS CO LTD2 citations62
US7046760B2May 16, 2006

Method of measuring and controlling concentration of dopants of a thin film

SAMSUNG ELECTRONICS CO LTD4 citations62
US6815236B2Nov 9, 2004

Method of measuring a concentration of a material and method of measuring a concentration of a dopant of a semiconductor device

SAMSUNG ELECTRONICS CO LTD3 citations62
US7289661B2Oct 30, 2007

Apparatus and method for inspecting a substrate

SAMSUNG ELECTRONICS CO LTD5 citations61
US7280233B2Oct 9, 2007

Method and apparatus for inspecting an edge exposure area of a wafer

SAMSUNG ELECTRONICS CO LTD4 citations61
US7274471B2Sep 25, 2007

Systems and methods for measuring distance of semiconductor patterns

SAMSUNG ELECTRONICS CO LTD2 citations61
US6927077B2Aug 9, 2005

Method and apparatus for measuring contamination of a semiconductor substrate

SAMSUNG ELECTRONICS CO LTD4 citations60
US6800863B2Oct 5, 2004

Method for monitoring an ion implanter and ion implanter having a shadow jig for performing the same

SAMSUNG ELECTRONICS CO LTD6 citations59
US7573568B2Aug 11, 2009

Method and apparatus for detecting a photolithography processing error, and method and apparatus for monitoring a photolithography process

SAMSUNG ELECTRONICS CO LTD1 citations52
US7355729B2Apr 8, 2008

Apparatus and method for measuring a thickness of a substrate

SAMSUNG ELECTRONICS CO LTD1 citations49
US7186577B2Mar 6, 2007

Method for monitoring a density profile of impurities

SAMSUNG ELECTRONICS CO LTD0 citations39

CHEORWON PLASMA RES INST

2 patents

LG ELECTRONICS INC

1 patent

SAMSUNG ELECTRIC

1 patent