Inventor
CHOI SUN-YONG
KR20 patents
⚠️ This page may combine multiple inventors who share the name “CHOI SUN-YONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
16 patentsUS5676824AOct 14, 1997
Water purifier with means for indicating when filter replacement is due and for automatically initiating a membrane washing step
SAMSUNG ELECTRONICS CO LTD48 citations89
US5755469AMay 26, 1998
Wafer transfer blade
SAMSUNG ELECTRONICS CO LTD15 citations69
US7113274B2Sep 26, 2006
Method and apparatus for inspecting a substrate
SAMSUNG ELECTRONICS CO LTD2 citations63
US7405817B2Jul 29, 2008
Method and apparatus for classifying defects of an object
SAMSUNG ELECTRONICS CO LTD2 citations62
US7310140B2Dec 18, 2007
Method and apparatus for inspecting a wafer surface
SAMSUNG ELECTRONICS CO LTD2 citations62
US7271890B2Sep 18, 2007
Method and apparatus for inspecting defects
SAMSUNG ELECTRONICS CO LTD2 citations62
US7046760B2May 16, 2006
Method of measuring and controlling concentration of dopants of a thin film
SAMSUNG ELECTRONICS CO LTD4 citations62
US6815236B2Nov 9, 2004
Method of measuring a concentration of a material and method of measuring a concentration of a dopant of a semiconductor device
SAMSUNG ELECTRONICS CO LTD3 citations62
US7289661B2Oct 30, 2007
Apparatus and method for inspecting a substrate
SAMSUNG ELECTRONICS CO LTD5 citations61
US7280233B2Oct 9, 2007
Method and apparatus for inspecting an edge exposure area of a wafer
SAMSUNG ELECTRONICS CO LTD4 citations61
US7274471B2Sep 25, 2007
Systems and methods for measuring distance of semiconductor patterns
SAMSUNG ELECTRONICS CO LTD2 citations61
US6927077B2Aug 9, 2005
Method and apparatus for measuring contamination of a semiconductor substrate
SAMSUNG ELECTRONICS CO LTD4 citations60
US6800863B2Oct 5, 2004
Method for monitoring an ion implanter and ion implanter having a shadow jig for performing the same
SAMSUNG ELECTRONICS CO LTD6 citations59
US7573568B2Aug 11, 2009
Method and apparatus for detecting a photolithography processing error, and method and apparatus for monitoring a photolithography process
SAMSUNG ELECTRONICS CO LTD1 citations52
US7355729B2Apr 8, 2008
Apparatus and method for measuring a thickness of a substrate
SAMSUNG ELECTRONICS CO LTD1 citations49
US7186577B2Mar 6, 2007
Method for monitoring a density profile of impurities
SAMSUNG ELECTRONICS CO LTD0 citations39
CHEORWON PLASMA RES INST
2 patentsUS9714171B2Jul 25, 2017
Graphene-nano particle composite having nano particles crystallized therein at a high density
CHEORWON PLASMA RES INST0 citations40
US9711256B2Jul 18, 2017
Graphene-nano particle composite having nanoparticles crystallized therein at a high density
CHEORWON PLASMA RES INST0 citations40