Inventor

LIN BURN-JENG

TW128 patents

⚠️ This page may combine multiple inventors who share the name “LIN BURN-JENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIN BURN-JENG

TAIWAN SEMICONDUCTOR MFG

Method to reduce CD non-uniformity in IC manufacturing

Apparatus for method for immersion lithography

Megasonic immersion lithography exposure apparatus and method

Apparatus and method for immersion lithography

Grid refinement method

Layout generation and optimization to improve photolithographic performance

Removal of line end shortening in microlithography and mask set for removal

Electron beam lithography system and method for improving throughput

Multiple-grid exposure method

Method for improving the critical dimension uniformity of patterned features on wafers

Hole printing by packing and unpacking using alternating phase-shifting masks

Printable assist lines and the removal of such

Method for electron beam proximity correction with improved critical dimension accuracy

Grid refinement method

Method for metal correlated via split for double patterning

Immersion lithography apparatus and methods

System and method for direct writing to a wafer

Method for forming a lithography pattern

Immersion optical projection system

Method and system for a pattern layout split

Complementary replacement of material

Pellicle stress relief

Method of defining forbidden pitches for a lithography exposure tool

Immersion lithography system with wafer sealing mechanisms

Immersion fluid for immersion lithography, and method of performing immersion lithography

Level adjustment systems and adjustable pin chuck thereof

Wafer repair method using direct-writing

Multiple-reticle mask holder and aligner

IBM

Simple repair method for phase shifting masks

Step and repeat apparatus having enhanced accuracy and increased throughput

Jig and process for contact printing

Dynamic magnetic bubble display system

TAIWAN SEMICONDUCTOR MFG CO LTD

Method of fabricating an integrated circuit with non-printable dummy features

Systems and methods for high-throughput and small-footprint scanning exposure for lithography

Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity

Method of fabricating an integrated circuit with optimized pattern density uniformity

LIN BURN JENG

Immersion lithography system using a sealed wafer bath

Immersion lithography system using direction-controlling fluid inlets

Immersion lithography system using a sealed wafer bath

WANG CHIEN-WEI

Patterning process and chemical amplified photoresist with a photodegradable base

Patterning process and photoresist with a photodegradable base

SHIN JAW-JUNG

Method for proximity correction

Electron beam lithography system and method for improving throughput

Liu pei-yi

Non-directional dithering methods

Error diffusion and grid shift in lithography

YU CHEN-HUA

Devices and methods for improved reflective electron beam lithography

CHANG CHING-YU

Apparatus and method for immersion lithography

WANG WEN CHUAN

Multiple-grid exposure method

WANG HSIEN-CHENG

Photoresist materials and photolithography processes

CHEN CHENG-HUNG

Efficient scan for E-beam lithography