Inventor
SIDDIQUI JUNAID AHMED
US26 patents
⚠️ This page may combine multiple inventors who share the name “SIDDIQUI JUNAID AHMED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
DUPONT AIR PROD NANOMATERIALS
15 patentsUS7077880B2Jul 18, 2006
Surface modified colloidal abrasives, including stable bimetallic surface coated silica sols for chemical mechanical planarization
DUPONT AIR PROD NANOMATERIALS50 citations96
US6893476B2May 17, 2005
Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal
DUPONT AIR PROD NANOMATERIALS52 citations95
US7691287B2Apr 6, 2010
Method for immobilizing ligands and organometallic compounds on silica surface, and their application in chemical mechanical planarization
DUPONT AIR PROD NANOMATERIALS20 citations92
US7429338B2Sep 30, 2008
Surface modified colloidal abrasives, including stable bimetallic surface coated silica sols for chemical mechanical planarization
DUPONT AIR PROD NANOMATERIALS17 citations92
US7153335B2Dec 26, 2006
Tunable composition and method for chemical-mechanical planarization with aspartic acid/tolyltriazole
DUPONT AIR PROD NANOMATERIALS33 citations92
US7022255B2Apr 4, 2006
Chemical-mechanical planarization composition with nitrogen containing polymer and method for use
DUPONT AIR PROD NANOMATERIALS36 citations92
US6743267B2Jun 1, 2004
Gel-free colloidal abrasive polishing compositions and associated methods
DUPONT AIR PROD NANOMATERIALS38 citations91
US6979252B1Dec 27, 2005
Low defectivity product slurry for CMP and associated production method
DUPONT AIR PROD NANOMATERIALS23 citations89
US7915071B2Mar 29, 2011
Method for chemical mechanical planarization of chalcogenide materials
DUPONT AIR PROD NANOMATERIALS17 citations82
US7514363B2Apr 7, 2009
Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use
DUPONT AIR PROD NANOMATERIALS13 citations82
US7513920B2Apr 7, 2009
Free radical-forming activator attached to solid and used to enhance CMP formulations
DUPONT AIR PROD NANOMATERIALS17 citations82
US7351662B2Apr 1, 2008
Composition and associated method for catalyzing removal rates of dielectric films during chemical mechanical planarization
DUPONT AIR PROD NANOMATERIALS11 citations82
US7476620B2Jan 13, 2009
Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers
DUPONT AIR PROD NANOMATERIALS8 citations80
US7316977B2Jan 8, 2008
Chemical-mechanical planarization composition having ketooxime compounds and associated method for use
DUPONT AIR PROD NANOMATERIALS7 citations73
US7247179B2Jul 24, 2007
Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal
DUPONT AIR PROD NANOMATERIALS3 citations62
SIDDIQUI JUNAID AHMED
3 patentsUS8163049B2Apr 24, 2012
Fluoride-modified silica sols for chemical mechanical planarization
SIDDIQUI JUNAID AHMED9 citations82
US8114775B2Feb 14, 2012
Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers
SIDDIQUI JUNAID AHMED11 citations79
US8722569B2May 13, 2014
Peroxide decomposition catalyst particles
SIDDIQUI JUNAID AHMED2 citations60
DU PONT
3 patentsUS6060156AMay 9, 2000
Porous alumina and partially calcined polysiloxane particles in interdraw coating resins for polyester film
DU PONT8 citations72
US6495309B1Dec 17, 2002
Polymeric film having a coating layer of a phosphonic acid group containing polymer
DU PONT8 citations69
US6117532ASep 12, 2000
Interdraw pretreatment for polyester film
DU PONT5 citations61