Inventor
OKINO TAKESHI
JP33 patents
⚠️ This page may combine multiple inventors who share the name “OKINO TAKESHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
27 patentsUS6303266B1Oct 16, 2001
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK149 citations99
US6824957B2Nov 30, 2004
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK42 citations96
US6280897B1Aug 28, 2001
Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts
TOSHIBA KK80 citations96
US5837419ANov 17, 1998
Photosensitive composition
TOSHIBA KK44 citations96
US6440636B1Aug 27, 2002
Polymeric compound and resin composition for photoresist
TOSHIBA KK58 citations95
US5962581AOct 5, 1999
Silicone polymer composition, method of forming a pattern and method of forming an insulating film
TOSHIBA KK72 citations95
US6660450B2Dec 9, 2003
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK18 citations93
US6541597B2Apr 1, 2003
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK20 citations93
US6291129B1Sep 18, 2001
Monomer, high molecular compound and photosensitive composition
TOSHIBA KK22 citations93
US6228552B1May 8, 2001
Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material
TOSHIBA KK39 citations93
US6045968AApr 4, 2000
Photosensitive composition
TOSHIBA KK26 citations93
US7388725B2Jun 17, 2008
Magnetic recording media, method of manufacturing the same and magnetic recording apparatus
TOSHIBA KK20 citations92
US6071670AJun 6, 2000
Transparent resin, photosensitive composition, and method of forming a pattern
TOSHIBA KK37 citations92
US5932391AAug 3, 1999
Resist for alkali development
TOSHIBA KK31 citations92
US8361339B2Jan 29, 2013
Antireflection structure formation method and antireflection structure
TOSHIBA KK6 citations84
US7319568B2Jan 15, 2008
Magnetic recording media, magnetic recording apparatus, and stamper
TOSHIBA KK16 citations84
US6410748B1Jun 25, 2002
Alicycli c group-containing monomer
TOSHIBA KK15 citations84
US9064522B2Jun 23, 2015
Stamper and method of manufacturing bit patterned medium using stamper
TOSHIBA KK3 citations63
US8654475B2Feb 18, 2014
Stampers and magnetic disks
TOSHIBA KK2 citations63
US7817377B2Oct 19, 2010
Original disk fabrication method, magnetic recording medium manufacturing method and magnetic recording medium
TOSHIBA KK2 citations63
US7738213B2Jun 15, 2010
Magnetic disk medium, reticle and magnetic recording and reproducing apparatus
TOSHIBA KK6 citations63
US7623311B2Nov 24, 2009
Recording media, recording and reproducing apparatus, and method for recording and reproducing
TOSHIBA KK2 citations63
US7163781B2Jan 16, 2007
Process for producing a semiconductor device
TOSHIBA KK2 citations63
US7119156B2Oct 10, 2006
Resist resin
TOSHIBA KK2 citations63
US7070905B2Jul 4, 2006
Pattern forming process
TOSHIBA KK1 citations63
US7029823B2Apr 18, 2006
Resist composition
TOSHIBA KK2 citations63
US7063932B2Jun 20, 2006
Resist resin
TOSHIBA KK0 citations52