Inventor
MORINAGA HITOSHI
JP32 patents
⚠️ This page may combine multiple inventors who share the name “MORINAGA HITOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIMI INC
9 patentsUS5366542ANov 22, 1994
Polishing composition
FUJIMI INC109 citations95
US10450651B2Oct 22, 2019
Article comprising metal oxide-containing coating
FUJIMI INC1 citations60
US10882157B2Jan 5, 2021
Polishing pad and polishing method
FUJIMI INC0 citations58
US10920104B2Feb 16, 2021
Abrasive, polishing composition, and polishing method
FUJIMI INC0 citations57
US11498182B2Nov 15, 2022
Polishing method and polishing pad
FUJIMI INC0 citations51
US9994748B2Jun 12, 2018
Polishing composition
FUJIMI INC0 citations50
US9879156B2Jan 30, 2018
Polishing composition
FUJIMI INC0 citations49
US10835805B2Nov 17, 2020
Sliding instrument and method for manufacturing same
FUJIMI INC0 citations48
US10434622B2Oct 8, 2019
Polishing tool and polishing method for member having curved surface shape
FUJIMI INC0 citations46
MITSUBISHI CHEM CORP
9 patentsUS6228823B1May 8, 2001
Method for treating surface of substrate and surface treatment composition used for the same
MITSUBISHI CHEM CORP60 citations94
US5885362AMar 23, 1999
Method for treating surface of substrate
MITSUBISHI CHEM CORP89 citations94
US7541322B2Jun 2, 2009
Cleaning solution for substrate for semiconductor device and cleaning method
MITSUBISHI CHEM CORP22 citations92
US6896744B2May 24, 2005
Method for cleaning a surface of a substrate
MITSUBISHI CHEM CORP30 citations92
US6143706ANov 7, 2000
Surface treatment composition and method for treating surface of substrate by using the same
MITSUBISHI CHEM CORP18 citations92
US6498132B2Dec 24, 2002
Method for treating surface of substrate and surface treatment composition used for the same
MITSUBISHI CHEM CORP20 citations91
US7235516B2Jun 26, 2007
Semiconductor cleaning composition comprising an ethoxylated surfactant
MITSUBISHI CHEM CORP15 citations84
US6228179B1May 8, 2001
Surface treatment composition and method for treating surface of substrate by using the same
MITSUBISHI CHEM CORP11 citations74
US7621281B2Nov 24, 2009
Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same
MITSUBISHI CHEM CORP7 citations73
OHMI TADAHIRO
4 patentsUS9476137B2Oct 25, 2016
Metal oxide film, laminate, metal member and process for producing the same
OHMI TADAHIRO6 citations84
US8206833B2Jun 26, 2012
Metal oxide film, laminate, metal member and process for producing the same
OHMI TADAHIRO8 citations84
US8124240B2Feb 28, 2012
Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure
OHMI TADAHIRO10 citations83
US8268735B2Sep 18, 2012
Semiconductor device manufacturing method and method for reducing microroughness of semiconductor surface
OHMI TADAHIRO1 citations52
MORINAGA HITOSHI
4 patentsUS8702472B2Apr 22, 2014
Polishing composition and polishing method using the same
MORINAGA HITOSHI6 citations71
US8226924B2Jul 24, 2012
Method for producing boehmite particles and method for producing alumina particles
MORINAGA HITOSHI2 citations58
US9149744B2Oct 6, 2015
Filtration method, method for purifying polishing composition using it, method for regenerating filter to be used for filtration, and filter regenerating apparatus
MORINAGA HITOSHI1 citations50
US8632693B2Jan 21, 2014
Wetting agent for semiconductors, and polishing composition and polishing method employing it
MORINAGA HITOSHI1 citations46