Inventor

MOSDEN AELAN

US29 patents

⚠️ This page may combine multiple inventors who share the name “MOSDEN AELAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MOSDEN AELAN

TOKYO ELECTRON LTD

Method of etching high aspect ratio features

Processing system and method for chemically treating a TERA layer

Plasma etching techniques

System and method of removing chamber residues from a plasma processing system in a dry cleaning process

Gas phase etch with controllable etch selectivity of silicon-germanium alloys

Isotropic silicon and silicon-germanium etching with tunable selectivity

Method and system for selective spacer etch for multi-patterning schemes

Plasma etching techniques

Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks

Method for fabricating NFET and PFET nanowire devices

Non-plasma etch of titanium-containing material layers with tunable selectivity to alternate metals and dielectrics

Method and system for treating a hard mask to improve etch characteristics

Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks

Gas phase etching system and method

Gas phase etch with controllable etch selectivity of metals

Plasma etching techniques

Lateral etching of silicon

Plasma etching techniques

Atomic layer etch (ALE) of tungsten or other metal layers

Selective gas phase etch of silicon germanium alloys

Method for lateral etch with bottom passivation

System and method of determining process completion of post heat treatment of a dry etch process

Gas phase etching system and method

Surface modification to achieve selective isotropic etch

Selective and isotropic etch of silicon over silicon-germanium alloys and dielectrics; via new chemistry and surface modification

Process integration techniques using a carbon layer to form self-aligned structures

O'MEARA DAVID L

Multilayer sidewall spacer for seam protection of a patterned structure

Multi-layer pattern for alternate ALD processes

Dual sidewall spacer for seam protection of a patterned structure